Zirconium Rotatable Sputtering Target for PVD coating systerm , High Density
Zirconium Rotatable Sputtering Target
Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target.
Description
JINXING company focus on the sputtering target ( Rotatable sputtering target , Planar Sputtering target , Spray Rotary sputtering target , Noble Metal sputtering target and Evaporation material . Material incluidng ( Ti Titanium, TiAl, TiSi, TiZr , Zr Zirconium , Cr Chrome, Mo, W Tungsten, WTi , Cu, Ni, Ta, Nb ) .
- Hot Pressing
- Hot Isostatic Pressing (HIP)
- Cold Isostatic Pressing (CIP)
- Vacuum Sintering
- Induction Melting
- Vacuum Melting & Casting
- Arc Melting
- Electron-Beam Melting
- Plasma Spraying
- Co-Precipitation
JINXING has developed a complete line of rotary cathode sputtering targets. Materials are either continuously cast, extruded, HIP'ed or plasma sprayed to provide technological advances in rotary design. In addition, unique profiles can be developed for specific applications to provide targets for better wear characterization, longer life, unique physical characteristics or altered metallurgical properties.
Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target.
| Grades: | R60702, 99.2%min |
| Purity: 99.5% | |
| Purity: 99.95% Hf<300ppm or Hf<4.5%) | |
| Shape: | Round Shape , Tube Shape and Plate Shape. |
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