Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron
high purity Rotatory Titanium sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Specification
| Composition | Ti |
| Purity |
CP Grade 2 (99.5%), CP Grade 1 (99.7%), 3N5 (99.95%), 4N (99.99%), 4N5 (99.995%) |
| Density | 4.51 g/cm3 |
| Grain Sizes | < 50 micron or on request |
| Fabrication Processes | Vacuum Melting, Forging, Extruding, Machining |
| Shape | Straight, Dog Bone |
| End Types | SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made |
| Surface | Ra 1.6 Micron or on request |
Related Magnetron sputtering rotating target
| Magnetron sputtering target,/rotating target (tube target) | |||||
| Item | purity | Density | shape | Dimension(mm) | |
| TiAl target | 2N8-4N | 3.6-4.2 | Tube,disc,plate |
OD70 x T 7 x L Other as customized |
|
| Cr target | 2N7-4N | 7.19 | Tube,disc,plate |
OD80 X T8 X L Other as customized |
|
| Ti target | 2N8-4N | 4.51 | Tube,disc,plate |
OD127 x ID105 x L OD219 x ID194 x L OD300 x ID155 x L Other as customized |
|
| Zr Target | 2N5-4N | 6.5 | Tube,disc,plate | Other as customized | |
| Al target | 4N-5N | 2.8 | Tube,disc,plate | ||
| Ni target | 3N-4N | 8.9 | Tube,disc,plate | ||
|
Cu target (copper ) |
3N-4N5 | 8.92 | Tube,disc,plate | ||
|
Cu target (brass) |
3N-4N5 | 8.92 | Tube,disc,plate | ||
| Ta target | 3N5-4N | 16.68 | Tube,disc,plate | OD146xID136x299.67(3pcs) |
Titanium Cylindrical Sputtering Targets Picture:
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