Ion Implantation Source Of Tungsten And Molybdenum Parts

Ion Implantation Source Of Tungsten And Molybdenum Parts is an important process in the production of semiconductors. Implanter systems dope wafers with foreign atoms to modify material properties such as conductivity or crystal structure. The beam path is the center of an implanter system. Here the ions are generated, concentrated, greatly accelerated, and focused on the wafer at very high speeds.

Our components and spare parts made from refractory metals help to ensure that this process is as efficient, precise, and free of impurities as possible.

Ion Implantation Source Of Tungsten And Molybdenum Parts Description

we provides high quality, precision machined molybdenum and tungsten components for processing equipment used in the manufacture of semiconductors, including Ion Implantation, MOCVD, CVD, PVD.
Ours manufacturing experience, expertise, and knowledge of the molybdenum and tungsten materials enable us to provide precision machined components that meet your specifications.

We supply tungsten, molybdenum, titanium and advanced ceramic components and spare parts for ion implanter in OEM quality.
Our main products including cathode, arc chamber, repeller, side/end plate and fastener in ion source of axcelis and varian implanter worked in production processing of 12" and 16" wafer.

The high-purity tungsten-molybdenum arc chamber is the basic guarantee for semiconductor chips. The high-performance ion source tungsten and molybdenum parts greatly reduce the frequency of machine maintenance and ensure the customer's production capacity, which is the best choice for customers.

Ion Implantation Source Of Tungsten And Molybdenum Parts Picture:

Specifications Of Molybdenum Ion Implantation Components