Pure molybdenum Ion Implantation Components on sale

Descriptions Of Molybdenum Ion Implantation Components

Our ion implantation components are made from molybdenum and tungsten due to these materials ideal combination of corrosion resistance, strength, and high thermal conductivity.

Temperatures of up to 1400 °C, strong electromagnetic fields, aggressive process gases and powerful mechanical forces cause problems for conventional materials. But not for our products. Our heat-resistant components made from molybdenum, tungsten, graphite or ceramics excel due their ideal combination of corrosion resistance, material strength, high thermal conductivity and absolute purity. 100 or more JX components are at work in every beam path. They ensure that the ions are generated efficiently and guided precisely and free from impurities along the beam path to the wafer.

Ion implantation is an important process in the manufacture of semiconductors. The most important part of an implanted system is the beam path. Here, the ions are generated, concentrated, accelerated, and targeted towards the wafer.

Molybdenum Ion Implantation Components Picture:

Our products.

Chambers (tungsten, molybdenum and alloys)

Filaments (tungsten and tungsten alloys)

Arc slits (tungsten, molybdenum and alloys)

Holders (tungsten, molybdenum and alloys)

Cathodes (tungsten, molybdenum and alloys)

Spare parts (tungsten, molybdenum and alloys)

Applications Of Molybdenum Ion Implantation Components

* Used for Ion implantation process.

* Used to manufacture semiconductors.

* Used in metal finishing for tool steel toughening and surface finishing.

* Used in ion beam mixing to achieve graded interface and strengthen adhesion between immiscible material.