China 24-Position Rotary Spin Coater with Customizable Substrate Sizes and Programmable Spin Profiles for High-Throughput Thin-Film Deposition for sale

24-Position Rotary Spin Coater with Customizable Substrate Sizes and Programmable Spin Profiles for High-Throughput Thin-Film Deposition

Price Negotiable

Price: Negotiation

MOQ: 1 set

Delivery Time: 30-45 days

Brand: OSMANUV

Product Description

Compact 24-Position Rotary Spin Coater | Customizable Substrate Sizes & Spin Programs for R&D and Pilot Production

Product Overview

This 24-station spin coater is designed for high-throughput thin-film deposition of photoresist, polymers, nanoparticles, and sol-gel materials. Each station operates independently or synchronously. The system supports customizable spin profiles (acceleration, duration, speed) for each station, making it ideal for both R&D and production environments.

Technical Specifications

Parameter	Value / Range	Customization Option
Number of stations	24	✔ Customizable (16/24/32 stations)
Substrate size	Up to 12" wafer or 300×300 mm panel	✔ Customizable chuck size
Spin speed range	100 - 12,000 rpm	✔ Programmable per station
Speed accuracy	±1 rpm	-
Acceleration range	100 - 10,000 rpm/s	✔ Adjustable per recipe
Spin time range	1 - 999 sec / step	✔ Customizable steps
Dispense volume	0.1 - 20 mL per nozzle	✔ Customizable nozzle type
Motor type	Brushless DC servo	-
Coating uniformity	±3% (across 24 stations)	✔ Upgradable to ±1%
Exhaust flow	150 - 500 m³/h	✔ Customizable exhaust interface
Power supply	220V / 50-60 Hz / 3.5 kW	✔ Customizable voltage
Dimensions (L×W×H)	1800×1200×900 mm	✔ Customizable footprint
Weight	520 kg	-

Applications

Semiconductor wafer coating (photoresist)
OLED & perovskite solar cell fabrication
Bio-chip & polymer film preparation
Anti-reflective coating for optics
Nanomaterial deposition (graphene, quantum dots)
R&D multi-condition screening (24 different parameters simultaneously)

Customization Options

We offer full customization:

Station count: 8 / 12 / 16 / 24 / 32 stations
Substrate shape & size: round wafers, square panels, irregular substrates
Dispense system: single-needle, multi-nozzle, spray, or inkjet
Environment control: humidity, temperature, particle filtration
Automation level: manual load, semi-auto, full inline integration
Software: customized recipe structure, barcode scanning, data export to MES

Key Features

Individual station control with independent spin motors

Touchscreen with recipe library (up to 999 recipes)

Real-time speed & time monitoring per station

Anti-drip vacuum detection for substrate hold

Automatic solvent dispenser sync

Low vibration and acoustic enclosure

Emergency stop and interlock protection

Customizable exhaust and waste collection tank

Support and Services

Installation and on-site training
18-month standard warranty (extendable)
Remote debugging and IoT support option
Annual calibration and preventive maintenance plan
Spare parts supply for ≥10 years
Custom software development support

Packing and Shipping

Packing: Anti-static vacuum-sealed + plywood export case (shock-proof, moisture-proof)
Shipping method: FOB / CIF by sea, air (express optional for benchtop units)
Lead time: 30-45 working days after order confirmation (customization adds 15 days)
Documents included: User manual, calibration certificate, CE declaration

Frequently Asked Questions

Q1: Can the 24 stations run different spin programs simultaneously?

A: Yes. Each station supports a customizable independent recipe (speed, time, acceleration).

Q2: What substrate sizes can I customize?

A: From 5×5 mm chips to 300×300 mm panels or 12" wafers. Please provide your substrate drawing.

Q3: Is this machine cleanroom compatible?

A: Yes. Class 100 (ISO 5) compatible with optional HEPA/ULPA filter module.