CTS200 Computer To Screen System 1000x1100mm with 2540dpi Resolution for Textile Decal Printing
The CTS200 Computer To Screen system represents advanced digital imaging technology for textile screen printing applications. This laser direct exposure machine eliminates traditional film positives while delivering exceptional precision and efficiency for decal production.
| Specification / Model | CTS200 |
|---|---|
| Max screen size (mm) | 1000x1100 |
| Min screen size (mm) | 400x400 |
| Max exposure size (mm) | 900x1000 |
| Screen frame thickness | 25-45mm (bespoke service available) |
| Imaging System | DMD DLP Technology |
| Emulsion thickness (EOM) | Solvent resistant emulsion 3μm-150μm, water resistant emulsion 3μm-350μm |
| Exposure time | 120-240s/㎡, #350 yellow mesh |
| Resolution | 2540dpi (Optional) |
| Raster | 133LPI |
| Focus system | Fixed focusing |
| File format | 1_bit tiff etc. |
| Laser type | UV laser, wavelength 405±5nm |
| Laser power | 20W/25W (Optional) |
| Equipment size (mm) | 2700x1550x1600 |
| Equipment net weight | 1100KG |
| Conditions | Yellow light room with cleanliness Class 10000, temperature 22±2°C, 40-70% relative humidity (No condensation) |
| Power | Single phase 220v, 50/60HZ, 4KW, gas 1L/min |
Delivers exceptional 2540dpi resolution with 133LPI raster capability, enabling superior halftone printing quality for textile applications.
Complete exposure process in just 3 minutes for 1000mm×1000mm screens. Eliminates manual alignment and significantly reduces labor requirements.
Eliminates expensive litho film positives and reduces the screen making process from 5 procedures to a single digital workflow.
GIS Tech Inc. operates a 20,000 square meter manufacturing and R&D facility in Fengxian County, Xuzhou, including 1,000 square meters of clean workshops. Additional R&D and after-sales centers in Suzhou cover 2,000 square meters, supported by a core team of 30 R&D professionals with expansion plans to 60. The company benefits from technical expertise from Japan and Germany, covering optics, mechanics, electronics, and software systems.
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