50X-500X Trinocular Inverted Metallurgical Microscope

M13102 50X-500X Trinocular Inverted Metallurgical Microscope Using an excellent infinity optical system, it can provide excellent optical performance. The compact and stable high-rigidity main body fully embodies the anti-vibration requirements of micromanipulation. The modularized functional design can facilitate the upgrade of the system to realize functions such as polarization observation, dark field observation, and bright field observation. The lighting system fully considers heat dissipation and safety, and the bulb can be replaced quickly. The ideal design that meets the requirements of ergonomics makes the operation more convenient and comfortable, and the space is wider. It can be used for microscopic observation of semiconductor silicon wafers, LCD substrates, solid powders and other industrial samples. It is an ideal instrument for research in the fields of materials science and precision electronic engineering.

Features:

- High-precision course and fine focusing mechanism.

- Large size mechanical mobile platform.

- Widely used in metallographic analysis, semiconductor silicon wafers detection, geological and mineral analysis, precise engineering, measurement and other fields.