High Vacuum Furnace HTCC MLCC Aluminum Nitride Substrate Debinding
HTCC MLCC Aluminum Nitride Substrate Debinding High Vacuum Furnace
1﹑Description
This equipment is a high-temperature vacuum degreasing and sintering integrated furnace specially developed by our company for the aluminum nitride ceramic substrate industry. It has a double-layer water-cooled vacuum shell structure and adopts graphite multi-temperature zone independent temperature control heating. It can perform vacuum and partial pressure degreasing dual modes. The gas adopts a multi-channel horizontal flow design structure, which can make the degreasing and debinding effect better. It is the first choice for the sintering process of producing aluminum nitride substrates.
2﹑Technical specification
| Chamber size
|
900X500X500mm
1500X500X500mm
|
| Design temperature | 2000℃ |
| Max temperature |
1850℃
|
| Heater | Graphite Rods |
| Control accuracy | ±1℃ |
| Temperature control method | PID automatic adjustment |
| Maximum power | Based on the size |
| Ventilation type | Inert gases such as nitrogen and argon |
| Lock door structure | Electric door lock structure |
| Control system | Touch screen + fully automatic PLC control system |
3﹑Patent
With proven engineering knowledge and more than 20 years' experience we can provide you the right furnace solution.
4﹑Customer Case in China
The first Mobile phone fast charging graphene heat dissipation film carbonization production line
The first ITO target powder roller furnace continuous production line in china
5﹑Foreign Customer
6﹑Package and shipment
We will well pack the goods based on the kinds of furnace and customer's requirement.
Get in Touch
Have questions about our products or want to discuss a custom order? Our team is ready to help you.




