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8/6/4/2inch LPCVD Oxidation Furnace Full Automation Low Oxygen Control Thin Film Deposition

Others
2025-05-12
Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.