Plasma Etching
High Purity Quartz Cover Ring Protecting Wafer Edges Preventing Contamination in Uniform Dry Plasma Etching Process
Price: FOB SHANGHAI
MOQ: 50ea or negotiable
Delivery Time: 30-45 days
A quartz cover ring in semiconductor etching guides reaction gases for uniform etching, protects the wafer edge, prevents contamination by sealing the process area, and withstands high temperatures and corrosive plasma, ensuring precise patterning, high yield, and longer equipment life. Description HIGH PURITY COVER RING Specification Φ384.2×Φ317.6×13T or customized Tolerance ±0.01mm Material GE, PQ, FLH or other specified quartz (either natural or synthetic) Surface