Glass Bangles Plasma Coating Machine Titanium evaporation Horizontal Type
ATOP Horizontal Type Glass Bangles Plasma PVD Coating Machine
The machine is consist of vacuum chamber, vacuum pumping system, bias power supply, coating system,
work-piece rotating system, cooling system and electrical controlling system.
| ATOP Horizontal Type Glass Bangles Plasma PVD Coating Machine |
Vacuum Chamber Size | Decide according to the substrate size and output |
Substrate | Glass, Plastic, metal bangles, rings etc |
Coating Film
| High-grade decorative coating. |
Coating Colors | Gold, rose gold,silver,purple,red,blue,black,white,gray etc. |
Applications | Glass, Plastic, metal bangles, rings etc |
Structure | Horizontal type ; single door type |
Features | Equipped with 1-2 sets new model evaporation electrode, ion source etc. easy |
Configuration | High pumping speed, high efficiency, energy saving, full automatic process controller |
Weight | 3Tons-8Tons accordingly |
1.It can be widely used to do the decorative coating and function coating on the surface of plastic,
ceramic, glass, resin,candle and metal material.
2.High efficiency,full automatic,integrating the vacuum technology,evaporation coating and
electromechanical integration technology together,Its an ideal equipment to do the high-grade decorative
coating.
3.It can be widely used in crafts,gifts,hardware appliances,accessories and electronics,machinery,light
industry and other industries.
(1). Power supply: five-wire three-phase, 380V±5%, 50Hz, with ground resistance<5Ω.
(2). Compressed air : 0.5~0.7Mpa.
(3). Cooling water can use city tap water, deionized water is best. Temperature of cooling water should
less than 25 °C . Water pressure should be 0.2Mpa to 0.4Mpa. And the water resource should have the
ability to add new water in rate more than one hundred liter per minute.
(4). Environmental condition: Floor, ceiling and walls should be clean. Indoor air should be clean, dry and
no-dust. No flammable, explosive and corrosive gas indoors.
(5). Coating air: Ar2,C2H2, N2, O2, high purity(≥99.99%).
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