ATOP Spoon/Knife/Fork Magnetron Sputtering Vacuum Coating Machine For Tableware

Magnetron sputtering working principle of vacuum coating machine, the so-called "splash", under the

action of the electrons in an electric field accelerates to the substrate in the process of collision with argon

atoms, ionization out large amounts of argon ions and electrons.The electron flies toward the substrate,

the argon ion speeds up the target material under the action of the electric field, sputtering out a large

number of target atom, and the neutral target atom (or molecule) is deposited on the substrate to form the

film.Secondary electron in accelerating to fly to the substrate by magnetic field in the process of lorentz

magnetic force, the influence of confined area near the target surface plasma, the plasma density in the

area is very high, secondary electron under the action of magnetic field around the target surface is

circular motion, the electron motion path is very long, constantly in the process of movement of the impact

ionization out large amounts of argon ion bombardment of target, after many times of collision of the

electron energy gradually reduce, cast off the yoke of the magnetic field lines, away from the target

material, the final deposition on the substrate.

1. Rapid deposition rate and small temperature rise can inhibit the phenomenon of fire and target

poisoning.

2. The high energy emitted by sputtering has significantly enhanced the membrane density and adhesion.

3. The touch screen +PLC can achieve full automatic control, automatic/manual switching;

4. Large volume, large loading capacity and high production efficiency.

5. The workpiece frame adopts the public rotation structure, which can set the automatic positive and

backward rotation, and the product is even good;

6. Reasonable configuration, quick pumping rate, low noise, low energy consumption;

7. The film layer deposited by this equipment can meet customer requirements in terms of density,

uniformity, purity and hardness