ATOP Horizontal type Glass Bracelet Multi-arc Ion PVD Coating Machine

(1). Power supply: five-wire three-phase, 380V±5%, 50Hz, with ground resistance<5Ω

(2). Compressed air : 0.5～0.7Mpa

(3). Cooling water can use city tap water, deionized water is best. Temperature of cooling water should

less than 25℃. Water pressure should be 0.2Mpa to 0.4Mpa. And the water resource should have the

ability to add new water in rate more than one hundred liter per minute.

(4). Environmental condition: Floor, ceiling and walls should be clean. Indoor air should be clean, dry and

no-dust. No flammable, explosive and corrosive gas indoors.

The principle of the electric arc is integrating cold cathode arc discharge self-sustained light unite pulse

technique and magnetron sputtering technology, thinning the particles to improve the properties of the

film. It can coat on the surface of the metal as well as nonmetal.

The machine is consist of vacuum chamber, vacuum pumping system, bias power supply, coating system,

work-piece rotating system, cooling system and electrical controlling system

Structure type:Vertical type or horizontal type

Chamber type:single door or double doors

 
 
1. It equipments cryogenic ion secondary source, some substrate without heating the material, It
 
can directly do the cold plating film at room temperature, save energy, increase productivity.
 
 
2. The maximum of the temperature for tool coating chamber can 600 degrees, In addition to the tool
 
Coater coating applications require heating device, other applications do not need the device.
 
 
3. High deposition rate, High coating speed, It can be widely used to do the decorative coating, functional
 
coating on a variety of products. So it is a ideal equipment to do the high-grade and best coating for mass
 
production.
 
 
4. Magnetron sputtering principle is based on the theory of the cathode glow discharge, it expend the
 
cathode surface magnetic field near the work piece surface. Then it improves the sputtered atom
 
ionization rate. It keeps the magnetron sputtering uniformity, also can improve the surface shining effect.
 
 
5. The arc plasma evaporation source is reliable, it can work under 40A current in optimizing the cathode
 
and the magnetic field structure,. It will happen atomic diffusion between the coating and the material. It
 
also has the advantages that lon Beam Assisted Deposition.
 
 
6. Vacuum pumping system, electric control system and complete vacuum coating system can be
 
customized according to user requirements.