PECVD Thin Film Coating Machine , Carbon-based film deposition for Hydrogen Fuel Cell Bipolar sheets Coating
PECVD Hydrogen Fuel Cell Power Module Sputtering System / SiC Fuel Cell Vacuum Metalizing Machine
FCV is the short name of Fuel Cell Vehicles, it is the newest technology for next generation of green cars. It can generate electrical energy continuously by electrochemical reaction between oxygen and hydrogen. It is different from the primary battery such as dry cell and rechargeable battery that needs to repeat charging.
The core technology is how to generate the electrical energy with fuel cell power module through electrochemical reaction between hydrogen as fuel and oxygen.
Hydrogen fuel cell as the most key important part of the power module, scientists, engineers, professors from transportation organizations and worldwide vehicles manufactures have made thousands tests and finally found the proper processing.
It is 100% envrionmetally friendly technology and vechiles.
Our machine RTSP1213-DC model is exclusively designed and developed for this appliation. We cooperated with Shanghai Jiaotong Unversity and SAIC Motor Corporation Limited Company.
Hydrogen Fuel Cell Power Module Sputtering System with the PECVD (Plasma Enhanced Chemical Vapor Deposition) Technology to deposit high uniformity, strong adhesion SiC thin films.
The Hydrogen fuel cell sputtering machine contains ion source, balanced/unblanced sputtering cathodes; with stable and large volume vacuum pumping system.
Hydrogen Fuel Cell Power Module Sputtering System Specifications
| MODEL | RTSP1213-DC | |||||||||
| MATERIAL | Stainless Steel (S304) | |||||||||
| CHAMBER SIZE | Φ1250*1350mm (H) | |||||||||
| CHAMBER TYPE | Front and back 2-doors structure, Vertical | |||||||||
| SINGLE PUMP PACKAGE | Rotary Piston Vacuum Pump | |||||||||
| Roots Vacuum Pump | ||||||||||
| Magnetic Suspension Molecular Pump | ||||||||||
| Rotary Vane Pump (Holding Pump) | ||||||||||
| TECHNOLOGY | Magnetron Sputtering, Ion Source PECVD | |||||||||
| POWER SUPPLY | Sputtering power supply + Bias Power supply + Ion Source | |||||||||
| DEPOSITION SOURCE | 2 pairs DC/RF Sputtering Cathodes + (2 pairs spare using) + Ion Source | |||||||||
| CONTROL | PLC+Touch Screen | |||||||||
| GAS | Gas Mass Flow Meters ( Ar, N2, C2H2, O2) Argon, Nitrogen and Ethyne,Oxygen | |||||||||
| SAFETY SYSTEM | Numerous safety interlocks to protect operators and equipment | |||||||||
| COOLING | Cooling Water | |||||||||
| CLEANING | Glow Discharge/Ion Source | |||||||||
| POWER MAX. | 150KW | |||||||||
| AVERAGE POWER CONSUMPTION | 75KW |
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The special designed rack and jig system can take out-move in completely for a substrates convenient loading/unloading.
Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.
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