PVD MF / DC Magnetron Sputtering Machine On Flatware , Stainless Steel Electronic Components
PVD MF / DC Magnetron Sputtering Machine On Flatware , Stainless Steel Electronic Components
MF/DC Magnetron Sputtering Deposition Equipment, PVD Sputtering on Flatware, Stainless steel electronic components
Summary: PVD arc evaporation perfectly combined with MF sputtering technology, generate the high end quality functional and aesthetic coatings on products surface.
Why MF Sputtering?
Compared with DC and RF sputtering, Mid-Frequency sputtering has become a main thin film sputtering technique for mass production of coating, particularly for the film deposition of dielectric and non-conductive film coatings on surfaces such as optical coatings, solar panels, multiple layers, composite material film etc.
It is replacing RF sputtering due to it operated with kHz rather than MHz for a much faster deposition rate and also can avoid the Target poisoning during compound thin film deposition like DC.
MF sputtering targets always existed with two-sets. Two cathodes are used with an AC current switched back and forth between them which cleans the target surface with each reversal to reduce the charge build up on dielectrics that leads to arcing which can spew droplets into the plasma and prevent uniform thin film growth--- which is what we called Target Poisoning.
With MF sputtering system, we can get graphite color, the LAB data: ( L: 30~35). A:-0.04, B:08
Key Words: Consumer Electronics PVD Decorative Coating, Stainless Steel Flatware PVD decoration,
Pearl high glossary PVD coating, finger ring black plating, medical instrument DLC coating,
Corrosion and wear resistance PVD films, high vacuum metalizer.
Royal Technology has developed 3 standardized Machines for different capacity to satisfy our customer’s demand and applications.
| Stainless Steel PVD Plating Machine Technical Specification | |||
| Model | RTAC1008-SPMF | RTAC1250-SPMF | RTAC1612-SPMF |
| Effective Chamber Size | Φ1000 x H800mm | Φ1250 x H1250mm | Φ1600 x H1200mm |
| Deposition Sources |
Cylinder Arc (steered circular arc for option) +MF Sputtering Cathode + Linear Ion Source |
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Vacuum Pumping System ( Leybold Pumps + Turbo Molecular Pump)
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SV300B - 1 set (300m³/hr) | SV300B - 1 set (300m³/hr) | SV300B - 2 set (300m³/hr) |
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WAU1001-1set (1000m³/hr) |
WAU1001-1set (1000m³/hr) |
WAU2001-1set (1000m³/hr) |
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| D60T- 1 set (60m³/hr) | D60T- 1 set (60m³/hr) | D60T- 1 set (60m³/hr) | |
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Turbo Molecular Pumps: 2 sets (3500L/S) |
Turbo Molecular Pumps: 2 sets (3500L/S) |
Turbo Molecular Pumps: 3 sets (3500L/S) |
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| Sputtering Power Supply | 1*24KW (MF) | 2*36KW(MF) | 3*36KW(MF) |
| Arc Power Supply | 6*5KW | 7*5KW | 8*5KW |
| Bias Power Supply | 1*24KW | 1*36KW | 1*36KW |
| Planetary Rods | 6/8 | 12/16 | 20 |
| Heaters | 6*2.5KW | 8*2.5KW | 9*2.5KW |
| Ultimate Vacuum | 9.0*10-4Pa (empty, clean,room temperature) | 9.0*10-4Pa (empty, clean,room temperature) | 9.0*10-4Pa (empty, clean,room temperature) |
| Cycle Time (depends on pump) | 40’~50’ depends on substrate material and coating recipes | ||
| Working Power Requirement | 3Phase 4 lines,AC380V,50HZ,35KW | 3Phase 4 lines,AC380V,50HZ,120KW | 3Phase 4 lines,AC380V,50HZ,150KW |
| Cooling Water | YES, industrial water chiller | ||
| Processing Gas (99.99%) | 4 ways | 4 ways | 4 ways |
| Footprint (mm) | 2000*2000*2300 | 4000*4500*3200 | 5500*5000*3600 |
| Total Weight(KGS) | 4500 | 7000 | 9000 |
| Total Power Consumption(Approx.) | 50KW | 110KW | 170KW |
| Actual Power Consumption(Approx.) | 30KW | 60KW | 80KW |
Above technical parameters only for reference, Royal Technology reserves the right for final production based on specified applications. We provide you not only the coating machine but the total coating solutions, turnkey-project service is available.
Coating Samples:
Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.
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