CsI950  High Vacuum Deposition System is exclusively designed for CsI and TII  metallization on scintillation screens in an extremely high vacuum environment. The CsI scintillators 200～600µm in thickness ranges with high uniformity of thickness and brightness performance:

Ultra- High Spatial Resolution of Imaging;
Fast response for sharper imaging;
Class leading edge-to-edge image areas;
Optical absorb layers or reflector layers;
Low patient X-ray dose.

Substrates Applied: TFT glass, Fiber Optic Plate, Amorphous-carbon plate, Aluminum plate

Application: for security check and inspection, high energy physics education, nuclear radiaton detection and medical imagings: chest examination, mamography, dental inter oral and panoramic.

Technical Advantages

Royal Technology provides 2 models machine:  CsI950 and CsI950A+

The model CsI950A+ is updated based on the 1st generation CsI950, its advantages:

1. Efficiency
-CsI-950A+ model is with 2-rotary rack structure based on Generation -one CsI-950 model.
-Double-capacity for max. size substrate: 500 x400mm.

2. Repeatability & Reproducibility
-Through high precised parameter control system,
-Automated process control software and program,
-User friendly operation.

3. Reliability
-24/7 days non-stop operation;
-Inficon Film Thickness Controller to monitor the film thickness inline.
-Temperature control accuracy: ±1 ℃, multi-stage setting, automatic temperature data recording and control
-Rotary racks equipped with Servo-Motor for high accuracy and stability.

4. Safety
-High vacuum pump: Magnetic Suspension Molecular Pump, with nitrogen gas blowing device to avoid hazard material be exposed in the air;
-All electrodes are equipped with safety protection sleeves.

Technical Parameters

Insite

Location:  China