AFK CE PTFE Stainless Steel Gas Filter 15L/Min Flow Rate 15Mpa Pressure for Semiconductor Industry
Price:
Negotiable
MOQ:
1
Delivery Time:
1WEEK
Brand:
AFK
Product Description
High-Purity Gas Filtration System
This precision gas filter is engineered for high-purity gas systems, utilizing advanced collision, diffusion, and interception mechanisms to remove particles from gas streams. Designed to meet stringent semiconductor industry standards, it ensures ultra-clean gas delivery for sensitive electronic manufacturing processes.
Product Features
- Wide application range with flow rates from 15 to 300 SL/min
- Compatible with most high-purity semiconductor process gases
- 3-nanoparticle filtration capacity maintains high flow efficiency with ultra-small pressure drop
- Ra 5 electropolished surface prevents internal contamination
- Cleaned with deionized water and baked with hot nitrogen to meet semiconductor standards
- Manufactured in one million dust-free aseptic workshop environment
- 100% helium leak tested for quality assurance
Technical Specifications
| Parameter | Specification |
|---|---|
| Filtration Accuracy | ≥0.0025μm |
| Filtration Efficiency | Removal rate 99.99999% ≥0.0025μm |
| Rated Flow | 15L/Min, 60L/Min, 120L/Min, 200L/Min, 300L/Min |
| Filter Composition | Filter Element: 316/PTFE, Shell: Stainless Steel 316L |
| Maximum Inlet Pressure | 21Mpa (310kgf/cm²) |
| Maximum Differential Pressure | 15Mpa (153kgf/cm²) |
| Maximum Working Temperature | 430℃ (Inert gas) |
| Helium Leakage Rate | 1×10⁻⁹ atm cc/sec |
| Surface Finish | ≤Ra 5μm |
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Company
Shenzhen Wofly Technology Co., Ltd.
Location
Foor 2, 4th Buidling, A Zone, Xinhe Xinxing Industrial 3th Zone, Fuhai Avenue, Baoan, Guangdong, China.
Contact Person
Catlin Zeng