High Temperature Vacuum Vapor Deposition Furnace with 1100C Maximum Temperature Range
High Temperature Vacuum Vapor Deposition Furnace with 1100C Maximum Temperature Range
1. Main technical parameters
3.1. Small floor space and reasonable layout.
3.2. High degree of automation.
3.3.Supporting auxiliary equipment such as tail gas neutralization device, titanium tetrachloride filling device, gas busbar, etc., can be provided.
3.4. Process control system is conducive to independent R&D of new processes.
It can be used for hard film material coatings,such as Tic,TiN,TiCN,a-Al2O3,k-Al2O3 on cemented carbide cutting inserts and other tools or parts.
Various types of graphite boats can be provided,and graphite boat coating services can be also offered.
The CVD reaction chambers are centrifugally cast with high-temperatuer alloy,which can greatly reduce deformation and increase the lift time to 200 furnaces.
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