Corrosion Resistance Molybdenum Based Sputtering Targets
Molybdenum-Based Sputtering Targets in Flat Panel
Description:
Molybdenum sputtering target is widely used in manufacturing LCD and touch screens (panels). It is also used for solar cells and solar water heating. We can provide pure molybdenum and molybdenum alloy targets with different shapes, including disc, planar, rotary as well as custom targets.
Pure molybdenum
Mo >99.95%
Properties of our molybdenum niobium (Mo10Nb) sputtering targets and other molybdenum alloy targets
-High density, to enable higher sputtering rates and higher quality film
- Corrosion resistance
- Low electrical resistance
- Great consistency
-High temperature resistance
Molybdenum sputtering target is target with high purity and balanced die size and distribution.
Molybdenum sputtering target is used in the microelectronic, flat panel display, data storage, optical glass coating and other industries. And it is used in vacuum coating, such as decorative materials, hardware tools, lens coatings, etc.
Related Products
| Product Name | Element | Purirty | Melting Point ℃ | Density (g/cc) | Available Shapes |
| High Pure Sliver | Ag | 4N-5N | 961 | 10.49 | Wire, Sheet, Particle, Target |
| High Pure Aluminum | Al | 4N-6N | 660 | 2.7 | Wire, Sheet, Particle, Target |
| High Pure Gold | Au | 4N-5N | 1062 | 19.32 | Wire, Sheet, Particle, Target |
| High Pure Bismuth | Bi | 5N-6N | 271.4 | 9.79 | Particle, Target |
| High Pure Cadmium | Cd | 5N-7N | 321.1 | 8.65 | Particle, Target |
| High Pure Cobalt | Co | 4N | 1495 | 8.9 | Particle, Target |
| High Pure Chromium | Cr | 3N-4N | 1890 | 7.2 | Particle, Target |
| High Pure Copper | Cu | 3N-6N | 1083 | 8.92 | Wire, Sheet, Particle, Target |
| High Pure Ferro | Fe | 3N-4N | 1535 | 7.86 | Particle, Target |
| High Pure Germanium | Ge | 5N-6N | 937 | 5.35 | Particle, Target |
| High Pure Indium | In | 5N-6N | 157 | 7.3 | Particle, Target |
| High Pure Magnesium | Mg | 4N | 651 | 1.74 | Wire, Particle, Target |
| High Pure Magnesium | Mn | 3N | 1244 | 7.2 | Wire, Particle, Target |
| High Pure Molybdenum | Mo | 4N | 2617 | 10.22 | Wire, Sheet, Particle, Target |
| High Pure Niobium | Nb | 4N | 2468 | 8.55 | Wire, Target |
| High Pure Nickel | Ni | 3N-5N | 1453 | 8.9 | Wire, Sheet, Particle, Target |
| High Pure Lead | Pb | 4N-6N | 328 | 11.34 | Particle, Target |
| High Pure Palladium | Pd | 3N-4N | 1555 | 12.02 | Wire, Sheet, Particle, Target |
| High Pure Platinum | Pt | 3N-4N | 1774 | 21.5 | Wire, Sheet, Particle, Target |
| High Pure Silicon | Si | 5N-7N | 1410 | 2.42 | Particle, Target |
| High Pure Tin | Sn | 5N-6N | 232 | 7.75 | Wire, Particle, Target |
| High Pure Tantalum | Ta | 4N | 2996 | 16.6 | Wire, Sheet, Particle, Target |
| High Pure Tellurium | Te | 4N-6N | 425 | 6.25 | Particle, Target |
| High Pure Titanium | Ti | 4N-5N | 1675 | 4.5 | Wire, Particle, Target |
| High Pure Tungsten | W | 3N5-4N | 3410 | 19.3 | Wire, Sheet, Particle, Target |
| High Pure Zinc | Zn | 4N-6N | 419 | 7.14 | Wire, Sheet, Particle, Target |
| High Pure Zirconium | Zr | 4N | 1477 | 6.4 | Wire, Sheet, Particle, Target |
Molybdenum Sputtering Target Picture:
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