Ion Implantation Parts In Molybdenum And Tungsten For Semiconductor
ion implantation parts in molybdenum and tungsten for semiconductor
Our Produces high-quality ion-implanted high-temperature parts made of tungsten, molybdenum and tantalum. The corrosion resistance, material strength, high thermal conductivity and absolute purity are greatly improved, and the performance is stable. We can guarantee excellent ion generation, accurate and free of impurities in the optical path to the wafer.
ion implantation parts in molybdenum and tungsten Properties
Excellent corrosion resistance
- Melting point
Excellent creep resistance
Good electrical and thermal conductivity
outstanding purity
Our heat-resistant components are made of molybdenum, tungsten, graphite or ceramics and offer good corrosion resistance, material strength, high thermal conductivity and absolute purity.
We can design, produce and process ion implantation parts in molybdenum and tungsten of different specifications and shapes according to customer requirements, and can provide key tungsten, molybdenum and tantalum components and consumables for the ion implanter arc reaction chamber (large beam current, medium beam current, high energy).
JX supplies high quality consumables and replacement parts for ion implanter beamlines. Equipment upgrades and modifications based on customer process improvement requirements are an additional service.
Ion Implantation Parts In Molybdenum And Tungsten Picture:

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