ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System
Price:
$380-5900 US dollars/set
MOQ:
1 set
Delivery Time:
15 working days
Brand:
XDEM
Product Description
Plasma Enhanced Chemical Vapor Deposition PECVD System Machine
PECVD system, by ionizing atom-containing gas with microwave or radio frequency, create active plasma locally, which will react easily to deposit and form the expected thin film. It is suitable for the PECVD process, such as silicon carbide coating ceramic substrate conductivity test, controlled growth of ZnO nanostructures, ceramic capacitors(MLCC) atomosphere sintering experiment,etc.
Product Display:
Packing & Shipping:
Wooden box with polyfoam filled inside to ensure safe transportation.
Parcels can be sent by sea, by air, by express,etc per customer's request.
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Company
Nanyang Xinda Electro-Mechanical Co., Ltd.
Location
1-404 CITY SPRING GARDEN, FANLI ROAD, NANYANG CITY, HENAN PROVINCE, P.R. CHINA
Contact Person
John Fang