KXA-50 EDI Module 0.3-0.7 m³/h High Current Efficiency for Semiconductor Industry Water Purification
The KXA-50 EDI Module delivers high current efficiency with water production flow of 0.3-0.7 m³/h, specifically designed for semiconductor industry applications. This electrodeionization technology produces ultra-pure water without chemical regeneration.
| Attribute | Value |
|---|---|
| Water Production Flow | 0.3-0.7 m³/h |
| Standard Water Production Flow | 0.5 m³/h |
| Resistivity of Produced Water | 15-18.25 MΩ·cm |
| Silicon and Boron Removal Rate | ≥99% |
| Recovery Rate | 90-95% |
| Primary Application | Semiconductor Industry |
EDI represents a revolutionary ultra-pure water technology that replaces traditional ion exchange methods. The modular stack design comprises multiple cell pairs between electrodes, including cation-exchange membranes (CEM), anion-exchange membranes (AEM), dilute compartments with resin beads, and concentrate compartments.
- Ion removal and transport under DC electric field
- Selective membrane technology blocks opposite-charge ions
- Resin enhancement for improved ion transport efficiency
- Concentration and rejection system flushes away impurities
- Chemical-free operation eliminates hazardous regeneration chemicals
- Continuous 24/7 production without regeneration downtime
- Low operating costs by reducing chemical purchase and disposal
- Consistent high-resistivity water (15-18.2 MΩ·cm)
- Minimal wastewater generation
- Compact, scalable modular design
- Easy integration with RO systems
- Full filling technology of middle partition ensures excellent water quality
- No salt addition or concentrate water circulation required
- High current efficiency with low voltage and energy consumption
- Parallel pipeline design with standard threaded interfaces
- Leak-proof structural design for reliable operation
- Semiconductor and microelectronics production
- Power generation boiler feed water
- Pharmaceuticals and biotechnology
- Chemical processing and manufacturing
- Laboratory analytical grade water production
- Electronics, semiconductors and precision machinery
- Power, chemical and metallurgical industries
- Medical water production facilities
- Food and beverage processing
- Ultrapure laboratory water systems
| Model | Water Flow Range (m³/h) | Standard Flow (m³/h) | Resistivity (MΩ·cm) | Silicon/Boron Removal | Recovery Rate |
|---|---|---|---|---|---|
| KXA-50 | 0.3-0.7 | 0.5 | 15-18.25 | ≥99% | 90-95% |
| KXA-100 | 0.5-1.4 | 1.0 | 15-18.25 | ≥99% | 90-95% |
| KXA-200 | 1.5-2.5 | 2.0 | 15-18.25 | ≥99% | 90-95% |
| KXA-300 | 2.5-3.5 | 3.0 | 15-18.25 | ≥99% | 90-95% |
| KXA-400 | 3-4.5 | 4.0 | 15-18.25 | ≥99% | 90-95% |
| KXA-500 | 4.5-5 | 5.0 | 15-18.25 | ≥99% | 90-95% |
| KXA-600 | 5-6.5 | 6.0 | 15-18.25 | ≥99% | 90-95% |
| KXA-700 | 5.5-7.5 | 7.0 | 15-18.25 | ≥99% | 90-95% |
For detailed application cases and industry-specific solutions, visit our technical resource center:
FG Water Technologies is part of Wuxi Fenigal Science and Technology Co. Ltd., specializing in water treatment equipment design, manufacturing, and international shipment for industrial sectors. Our technical staff brings over 10 years of experience in water treatment system design, ensuring reliable performance across demanding applications.
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