Fully Automatic 24-Station Spin Coater with Customizable Dispense & Spin Speed for High Uniformity and Zero Cross-Contamination
Price:
Negotiation
MOQ:
1 SET
Delivery Time:
30 days
Brand:
OSMANUV
Product Description
FULLY AUTOMATIC 24-SPIN PROCESSOR FOR R&D TO PRODUCTION | CUSTOMIZABLE DISPENSE & SPIN SPEED
This 24-station spin coater is designed for automated, high-throughput thin-film deposition. Each of the 24 independent coating positions can be loaded with substrates up to 200 mm diameter (or 156×156 mm square). The system sequentially completes dispense, acceleration, spin-hold, and edge-bead removal steps via a customizable recipe database.
Key Advantages
- Zero cross-contamination - individual bowls and exhaust for each station
- High uniformity < ±3% at 3000 rpm across all stations
- Full customization - substrate material (Si, glass, polymer, metal), gas purging (N₂, clean dry air), and post-spin rinse steps
Technical Parameters
| Parameter | Standard Value | Customizable Range |
|---|---|---|
| Number of stations | 24 | 12 / 16 / 24 / 32 (customizable) |
| Max substrate size | 200 mm diameter or 156×156 mm square | 50 - 300 mm (customizable chuck) |
| Spin speed range | 0 - 6000 rpm | 0 - 10000 rpm |
| Speed accuracy | ±1 rpm | -- |
| Spin acceleration | 200 - 10000 rpm/s | customizable up to 20000 rpm/s |
| Coating uniformity | < ±3% @3000 rpm | ±2% available |
| Process gases | 1 channel (N₂) | 2 - 4 gas channels (customizable) |
| Dispense types | Static / dynamic | Up to 3 dispense steps per recipe |
| Exhaust flow per station | 45 m³/h | 30 - 80 m³/h (customizable) |
| Environment | Class 10 cleanroom compatible | Class 1 option |
| Power supply | 400V / 50 Hz / 3P | 208V - 480V (customizable) |
| Machine dimensions (W×D×H) | 2100 × 1200 × 1900 mm | width/depth customizable |
Production Line Integration
When integrated into a coating line, the 24-station spin coater typically works with:
- Loader / unloader (magazine-to-magazine or cassette-to-cassette) - customizable interface
- Pre-alignment station - optional edge/notch alignment
- 24-station spin coater - main unit
- Edge bead remover (EBR) - integrated or separate station
- Post-coating bake plate - hotplate or IR (programmable)
- Cooling station - active or passive
- Central chemical dispense system - 1-12 bottles with auto-refill
- Exhaust & solvent recovery system - customizable for photoresist, PI, PMMA, etc.
Applications
- Semiconductor - photoresist coating (i-line, KrF, ArF)
- Perovskite solar cells - large-area uniform deposition
- OLED / QLED - hole injection/transport layers
- MEMS & microfluidics - SU-8, PDMS, polymer coatings
- R &D & pilot line - multi-substrate process development
- Glass / sapphire / ceramic substrates - surface planarization
- Lithium battery - slurry coating on separator or electrode
Customization Options
This 24-station spin coater is highly customizable in the following aspects:
- Substrate size & shape - round, square, rectangle, or custom cutouts
- Chuck design - vacuum, mechanical clamp, or electrostatic chuck
- Bowl material - PP, PVDF, PTFE, or stainless steel (for aggressive solvents)
- Dispense nozzles - up to 3 independent nozzles per station, customizable XY motion
- Process gases - N₂, clean dry air, Ar, or forming gas
- Backside rinse & edge bead removal - programmable
- Recipe library - unlimited storage for 1000+ custom recipes
- Interface - SMEMA, SECS/GEM, OPC-UA, or Modbus TCP
- Safety - explosion-proof configuration for flammable solvents
Key Features
- Independent station monitoring - each station tracks film thickness trend and alarm history
- Active lid interlock - prevents operation when bowl cover is open
- Solvent drip catcher - reduces maintenance frequency
- Fast recipe download - < 1 sec to change all 24 stations
- Data logging - CSV export per station (spin speed vs. time)
- Low vibration design - < 0.5 µm/s² at maximum speed
- Energy-saving mode - exhaust speed automatically reduced when idle
Support and Services
- Remote installation guidance - video call setup included
- 24/7 technical support - engineering team on call (English/Chinese)
- On-site training - optional (3 days)
- 12-month warranty - extendable to 36 months
- Spare parts availability - 5 years guaranteed
- Process development support - free recipe optimization for your material
Packing and Shipping
| Item | Method |
|---|---|
| Packing | Vacuum-sealed + anti-static foam + plywood crate (VCI corrosion protection) |
| Shipping term | FOB / CIF / DDP (choose at quote) |
| Lead time | 45 - 60 working days (customized: +15 days) |
| Transport | 40' HC container (1 unit per container) or air freight for urgent orders |
| Documents | Commercial invoice, packing list, CE declaration, operation manual (digital + printed) |
Frequently Asked Questions
Q1: Can different substrates be coated simultaneously on different stations?
A: Yes, each station runs independently. For example, station 1-6 can coat 4-inch wafers, while station 7-12 coat 6-inch wafers -- fully customizable.
Q2: Does the machine support high-viscosity materials (>1000 cP)?
A: Yes. We provide customizable slow-dispense and high-torque spin motors (up to 1.5 N*m) for thick photoresist or polyimide.
Q3: How long does it take to switch from one photoresist to another?
A: With the optional customizable quick-clean bowl design, changeover < 10 minutes per station. Central chemical lines can be flushed automatically.
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Get in Touch
Have questions about our products or want to discuss a custom order? Our team is ready to help you.
Company
Dongguan Osmanuv Machinery Equipment Co., Ltd
Location
28 the second industrial, Liu chong wei , Wanjiang ,DongGuan , Guangdong, China
Contact Person
Zhang guoxin