Zhenan Metallurgy Co., Ltd
                                                                                                           
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Since 2019
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Vacuum Packaging 99.95% Tungsten Products Sputtering Target Vacuum Coating

Price Negotiable
Price: Negotiable
MOQ: Negotiable
Delivery Time: 7-10 work days after received the payment
Brand: ZHENAN
Product Description

Tungsten Sputtering Target

 

Description:

 

    Tungsten sputtering target is a product made of pure tungsten powder as raw material. It has a silvery white appearance and is popular in many fields because of its excellent physical and chemical properties.

 

Specifications:


 

Material Type Tungsten
Symbol W
Atomic Weight 183.84
Atomic Number 74
Color/Appearance Grayish White, Lustrous, Metallic
Thermal Conductivity 174 W/m.K
Melting Point (°C) 3,410
Coefficient of Thermal Expansion 4.5 x 10-6/K
Theoretical Density (g/cc) 19.25
Z Ratio 0.163
Sputter DC
Max Power Density
(Watts/Square Inch)
100*
Type of Bond Indium, Elastomer
Comments Forms volatile oxides. Films hard and adherent.

 

Application:

 

Tungsten sputtering targets have high purity, and the purity of the targets after sintering and forging can usually be higher than 99.95%. Generally speaking, when other conditions remain unchanged, the higher the purity of the target material, the better the electrical properties of the coating produced, and the corresponding circuit is less likely to be short-circuited or damaged.

The cost is relatively reasonable. Direct pressing using powder metallurgy is faster, which can effectively shorten the production cycle and thereby reduce costs.High density, the density of the target material after sintering and forging can reach more than 19.1g/cm³.

Tungsten Alloy Sputtering Target are widely used in flat panel displays, solar cells, integrated circuits, automotive glass, microelectronics, memory, X-ray tubes, medical equipment, smelting equipment and other products.

Tungsten Sputtering Target are generally prepared using powder metallurgy methods. First, place the tungsten powder in a vacuum heat treatment furnace for pre-degassing, then introduce hydrogen and continue heating for degassing; second, complete the sintering of the degassed tungsten powder through vacuum hot pressing;

Third, sinter Tungsten sputtering targets once The sintered product is secondary sintered through a hot isostatic press; fourth, the entire surface of the secondary sintered product is ground through mechanical processing to obtain the product. Note: 1) The purity of tungsten powder must be above 99.999% and the particle size should be between 3.2-4.2μm.

 

FAQ:

 

Q: Are you a factory or trading company?
       A: Both. We have 4500 square meters production workshop and professional service team in Henan Province, China.

 

Q: Do you provide samples?
       A: Yes, we provide free samples for you to reference, you only need to pay for freight.

 

Q: Can we visit the factory?
       A: We looking forward to you visit our factory at any time.

Hot Tags: tungsten sputtering target, China tungsten sputtering target manufacturers, suppliers, factory

 

Get in Touch

Have questions about our products or want to discuss a custom order? Our team is ready to help you.

Company Zhenan Metallurgy Co., Ltd
Location Huafu Commercial Center, Wenfeng District, Anyang City, Henan Province, China
Contact Person xie

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