Description

Sputtering targets are materials used to grow thin films by the sputtering process. These targets are fabricated from high-purity metals or ceramics through advanced melting, sintering, synthesis, and precision machining techniques.

We provide sputtering targets in a wide range of materials, purities, and shapes, manufactured using the optimal method for each material and application. Custom fabrication is available to meet specific user requirements and performance needs.

Specification

Application

Titanium Targets

Titanium Sputtering Targets are widely used in hardware tool coatings, decorative coatings, semiconductor components, and flat display coatings.
They are essential materials for integrated circuit manufacturing, often requiring purity levels above 99.99%.

Aluminum Targets

Used in semiconductor applications for their excellent heat resistance and versatility. Aluminium coatings are found in vehicles, aircraft, and various consumer products.

Copper Targets

Valued for high electrical conductivity, copper targets are commonly used in electrode production, wiring, and thin conductive films.

Tin Targets

Applied to improve the corrosion resistance of coated materials.

Zinc Targets

Used for corrosion barrier coatings and in products like batteries, paints, and propellants.

Precious Metal Targets

Platinum, Silver, and Gold targets offer a unique combination of chemical inertness and electrical conductivity, ideal for precision instruments and electronic components.

Key Features

High purity up to 99.995%

Superior film adhesion and uniform deposition

Strong corrosion and oxidation resistance

High density and mechanical stability

Compliant with ASTM and ISO standards

Custom shapes, sizes, and alloy compositions available