Titanium SS 304 PVD Coating Sputtering Targets 100*40mm 95*45mm 98*10mm for Industrial

Description

Sputtering targets are materials from which thin films are grown using the sputtering method. These targets are fabricated by processing metals or ceramics.
We provide sputtering target products in a wide variety of materials, purities, and shapes by combining advanced technologies in melting, sintering, synthesis, and precision mechanical processing.

Fabrication methods and customisation can be selected according to your application and requirements. Each target is produced using the most suitable process to ensure optimal performance and quality.

Specification

Application

Titanium Targets

Titanium sputtering targets are widely used for hardware tool coatings, decorative coatings, semiconductor components, and flat-panel display coatings.
They are core materials in the production of integrated circuits, requiring purities typically above 99.99%.

Aluminum Targets

Aluminium sputtering is commonly used in semiconductor applications and for thin-film coatings due to its versatility and excellent heat resistance. It is widely used in electronics, aerospace, and consumer goods industries.

Copper Targets

Copper targets are ideal for applications requiring high electrical conductivity, such as electrodes, wiring, and windshield films.

Tin Targets

Tin sputtering enhances corrosion resistance and is used to improve the surface properties of other materials.

Zinc Targets

Zinc targets are applied for their corrosion protection capabilities, commonly used in cathode production, batteries, propellants, and paints.

Precious Metal Targets (Platinum, Silver, Gold)

These targets provide outstanding chemical inertness and electrical conductivity, making them excellent for instrumentation, sensors, and electrodes.