Description

Sputtering targets are materials used to produce thin films through the sputtering deposition process. These targets are fabricated by processing metals or ceramics using advanced technologies such as melting, sintering, synthesis, and precision mechanical machining.

We offer sputtering targets in a wide range of materials, purities, and geometries, combining our expertise in materials science and manufacturing.
Custom fabrication and optimisation are available to meet each customer’s specific application requirements and target material properties.

Specification

Applications by Material

Titanium Targets

Titanium sputtering targets are widely used in hardware tool coatings, decorative coatings, semiconductor components, and flat display coatings.
Titanium is also a core material in integrated circuit fabrication, where purities above 99.99% are typically required.

Aluminum Targets

Used in semiconductor and display applications for their heat resistance and lightweight properties. Aluminium is also common in aerospace, automotive, and consumer products.

Copper Targets

Preferred in applications demanding high electrical conductivity, such as electrodes, plumbing, wiring, and optical films.

Tin Targets

Applied to improve corrosion resistance and surface protection in coated materials.

Zinc Targets

Valued for corrosion protection and barrier coatings. Often used in battery cathodes, propellants, and industrial coatings.

Precious Metal Targets (Platinum, Silver, Gold)

Employed in high-performance electronic and optical applications. These metals offer chemical inertness, excellent conductivity, and superior film quality.