12x12x0.3mm MPCVD Rough Large Lab Created Diamonds VVS Plate CVD Substrate with <20nm Surface Roughness
Price:
To be negotiated
MOQ:
1-1000PCS
Delivery Time:
5-8 WORK DAYS
Brand:
Infi
Product Description
MPCVD Rough Large Lab Created Diamonds VVS Diamond Plate
Single crystal diamond CVD (chemical vapor deposition) is produced using the CVD process, where carbon-containing gases are decomposed under controlled conditions to form a single crystal diamond layer on a substrate.
Product Specifications
| Parameter | Specifications |
|---|---|
| Suggested Application | Substrate/seeds for single crystal CVD growth |
| Crystal Growth Process | CVD (Chemical Vapor Deposition) |
| Color | Colorless |
| Available Sizes | 3x3x0.3mm, 4x4x0.3mm, 5x5x0.3mm, 6x6x0.3mm, 7x7x0.3mm, 8x8x0.3mm, 9x9x0.6mm, 10x10x0.3mm, 11x11x0.3mm, 12x12x0.3mm, 13x13x0.3mm, 15x15x0.3mm |
| Orientation | 4pt/100 |
| Lateral Dimensions | Measured to smaller side |
| Edges | Laser Cut |
| Edge Orientation | <100> edges |
| Face Orientation | {100} faces |
| Lateral Tolerance | L + W tolerance (0, +0.3mm), thickness tolerance (0, +0.1mm) |
| Surface Roughness (Ra) | Two sides polished: Ra < 20nm One side polished Unpolished |
| Boron Concentration [B] | < 0.05 ppm |
| Nitrogen Concentration | < 20 ppm |
Key Benefits
- Length, width and thickness all positive tolerance
- No polycrystalline black spots or cracks under 20x magnifying glass
- Perfect cutting without small missing corners
- Uniform stress distribution under polarizer
- Exceptional hardness and thermal conductivity
- Highly ordered crystal structure for improved physical properties
Technical Properties
Single crystal diamond CVD features exceptional hardness and thermal conductivity, making it ideal for industrial and scientific applications including cutting and grinding tools, heat spreaders, and optical components. The highly ordered crystal structure provides superior physical and mechanical properties compared to other synthetic diamond forms.
Manufacturing Process
Produced using microwave plasma-assisted chemical vapor deposition (MPACVD), where microwave resonance breaks down carbon-containing gas at low and medium pressures to generate plasma. The growth strategy enables homoepitaxial growth in the 100, 110 and 111 growth directions of type IIb diamond seed crystals.
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Get in Touch
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Company
Shaper Diamond Technology Co., Ltd
Location
NO431 Ruifu, Shaoshan North Road, Yuhua District ,Changsha, Hunan Province, China
Contact Person
Alice Wang