Fluorinating agent Chemical Vapor Deposition (CVD) ProcessesSemiconductor Industry Usage Tungsten Hexafluoride
Product Description
Tungsten hexafluoride (WF6) is a chemical compound composed of one tungsten atom bonded to six fluorine atoms. It is a colorless, highly reactive gas at room temperature and pressure. Here are some key aspects of tungsten hexafluoride gas:
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Formula and Structure: The chemical formula for tungsten hexafluoride is WF6. It consists of one tungsten (W) atom bonded to six fluorine (F) atoms. The molecule has an octahedral structure, with the tungsten atom at the center and the fluorine atoms arranged around it.
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Physical Properties: Tungsten hexafluoride is a gas at standard temperature and pressure (STP). It boils at around 17.1°C (62.8°F) and is typically stored and handled in pressurized cylinders. It is denser than air, with a density of about 13.1 g/L.
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Reactivity: WF6 is extremely reactive and readily reacts with a wide range of substances, including water, oxygen, and many organic compounds. It is a powerful oxidizing agent, meaning it can readily accept electrons from other substances. It can react violently with water, releasing corrosive hydrofluoric acid and tungsten oxide.
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Uses: Tungsten hexafluoride finds applications in various industrial processes and research activities. Some common uses include:
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Chemical Vapor Deposition (CVD): WF6 is used in the CVD process to deposit thin films of tungsten on surfaces. This technique is employed in the microelectronics industry for fabricating integrated circuits and other electronic components.
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Metal Organic Chemical Vapor Deposition (MOCVD): WF6 is utilized in MOCVD processes to deposit thin films of tungsten for applications in optical coatings, semiconductor devices, and other thin-film applications.
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Nuclear Reactor Control Rods: Tungsten hexafluoride can be used as a precursor for the production of tungsten control rods used in nuclear reactors.
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Laboratory and Research: It is used in various research applications, such as studying chemical reactions, catalysts, and as a precursor in synthesizing other tungsten compounds.
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Safety Considerations: Tungsten hexafluoride is highly toxic and corrosive. Its reaction with moisture can release toxic and corrosive hydrofluoric acid, which can cause severe burns and tissue damage. Proper safety precautions, including the use of protective equipment and handling procedures, should be followed when working with this compound.
It's important to note that the information provided here is based on general knowledge, and specific applications or safety considerations may vary depending on the context and intended use. Always consult reliable sources and follow appropriate safety protocols when working with any chemical compound.
Tungsten Hexafluoride WF6 GAS
CAS No.: 7783-82-6
EINECS No.: 232-029-1
UN No.: UN2196
Purity: 99.999%
Dot Class: 2.3
Appearance: Colorless
Grade Standard: Electron Grade,Industrial Grade
The COA of Product:
| Test items | Units | Quality requirements | Test results |
| CF4 | ppm | <0.5 | <0.01 |
| O2 | ppm | <0.5 | <0.01 |
| N2 | ppm | <1 | 0.03 |
| CO | ppm | <0.5 | <0.02 |
| CO2 | ppm | <0.5 | <0.01 |
| SiF4 | ppm | <0.5 | <0.1 |
| SF6 | ppm | <0.5 | <0.1 |
| HF | ppm | <5 | 0.19 |
| Al | ppb | ≤10 | <0.020 |
| As | ppb | ≤10 | <0.001 |
| B | ppb | ≤10 | <0.005 |
| Ca | ppb | ≤5 | <0.200 |
| Cd | ppb | ≤2 | <0.001 |
| Cr | ppb | ≤10 | <0.020 |
| Fe | ppb | ≤10 | <0.007 |
| K | ppb | ≤5 | <0.100 |
| Mn | ppb | ≤10 | <0.001 |
| Na | ppb | ≤5 | <0.040 |
| Th | ppb | ≤0.1 | <0.001 |
| Ti | ppb | ≤10 | <0.002 |
| Li | ppb | ≤10 | <0.002 |
| U | ppb | ≤0.05 | <0.001 |
| Zn | ppb | ≤10 | <0.005 |
| Si | ppb | ≤10 | <0.100 |
| Pb | ppb | ≤10 | <0.001 |
| P | ppb | ≤2 | <0.300 |
| Mg | ppb | ≤10 | <0.020 |
| Ni | ppb | ≤20 | <0.030 |
| Cu | ppb | ≤5 | <0.005 |
| Mo | ppb | ≤10 | <0.001 |
| Total impurities of other metal | ppb | ≤500 | <0.0010 |
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