Features :

High purity: Titanium sputtering targets are made from high-purity titanium metal, typically 99.99% or higher, to ensure the highest quality and consistency of the deposited thin film.

Customizable size and shape: Titanium sputtering targets are available in various sizes and shapes, including round, rectangular, and annular, to meet specific requirements of the sputtering process.

Good thermal and electrical conductivity: Titanium sputtering targets have good thermal and electrical conductivity, making them suitable for a range of applications.

High melting point: Titanium has a high melting point of 1668°C, making it suitable for high-temperature sputtering applications.

Applications :

Semiconductor industry: Titanium sputtering targets are used in the semiconductor industry to deposit thin films of titanium and titanium-based materials for integrated circuits, microprocessors, and other electronic components.

Optics industry: Titanium sputtering targets are used in the optics industry to deposit thin films of titanium for mirrors, filters, and other optical components.

Solar energy industry: Titanium sputtering targets are used in the solar energy industry to deposit thin films of titanium and titanium-based materials for solar cells and other photovoltaic devices.

Automotive industry: Titanium sputtering targets are used in the automotive industry to deposit coatings on engine components to improve their performance and durability.

Medical devices: Titanium sputtering targets are used in the production of medical devices, including implants and diagnostic sensors, due to titanium's biocompatibility and corrosion resistance.