Alumina Products Customized For High-Temperature And Corrosion-Resistant Components
Alumina Products Customized For High-Temperature And Corrosion-Resistant Components
Our high-precision alumina ceramic components utilize ultra-pure Al₂O₃ material (≥99.6% purity) specifically engineered for precision instrumentation applications. Featuring nanometer-level surface finish (Ra≤0.05μm) and micron-level dimensional accuracy (±0.005mm), these components meet the most demanding requirements in semiconductor equipment, optical instruments, and medical devices.
Key Applications
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Semiconductor Manufacturing: Wafer handling arms, vacuum chamber liners, plasma nozzles
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Optical Instrumentation: Laser mirror mounts, spectrometer slit assemblies, interferometer reference platforms
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Medical Analysis Equipment: Mass spectrometer ion sources, chromatographic ceramic columns, PCR thermal cycling modules
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Scientific Research: UHV flanges, cryogenic experimental platforms, synchrotron radiation optics
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Industrial Metrology: CMM probe tips, surface profilometer reference blocks, roundness tester turntables
Outstanding Features
✦ Ultra-Precision Machining: Profile accuracy ≤0.1μm, angular tolerance ±5 arcseconds
✦ Exceptional Stability: CTE 7.2±0.1×10⁻⁶/℃ (20-100℃)
✦ Ultra-Clean Surface: Metal ion content <1ppm
✦ Functional Customization: Integrated conductive/insulative/antistatic zones
✦ Environmental Resistance: Radiation tolerance >10⁶Gy, outgassing rate <10⁻¹¹Pa·m³/s
Technical Specifications
| Parameter | Specification |
|---|---|
| Material Purity | Al₂O₃≥99.6% |
| Density | 3.92±0.02g/cm³ |
| Surface Roughness | Ra≤0.05μm |
| Flatness | ≤0.1μm/25mm |
| Vickers Hardness | HV0.5≥1800 |
| Vacuum Tightness | Leak rate <10⁻¹⁰mbar·L/s |
Precision Manufacturing Process
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Ultra-Fine Powder Processing: 50nm alumina powder spray granulation
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Isostatic Pressing: 200MPa cold isostatic pressing
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Atmosphere Sintering: Hydrogen atmosphere sintering at 1700℃
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Ultra-Precision Machining: 5-axis slow wire EDM + diamond grinding
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Cleanroom Processing: Class 100 ultrasonic cleaning
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Full Inspection: White light interferometry + CMM complete dimensional verification
Usage & Maintenance
▷ Use dedicated cleanroom tools and ESD gloves during installation
▷ Recommended operating temperature: -60℃ to 450℃
▷ Avoid strong corrosive media (HF, hot phosphoric acid, etc.)
▷ Plasma cleaning recommended every 500 operating hours
▷ Storage conditions: 22±1℃, 45±5% RH
Service Commitment
✔ Free application technical consulting
✔ 72-hour rush order service
✔ 10-year product performance traceability
✔ Cleanroom packaging + nitrogen purge shipping options
Technical FAQ
Q: Can you meet ISO-10110 optical surface standards?
A: Capable of λ/20@632.8nm optical flatness
Q: Do you offer conductive ceramic solutions?
A: Customizable surface resistance 10⁴-10¹⁰Ω
Q: Maximum single-piece dimensions?
A: Current capability 300×300×50mm (larger assemblies available)
Q: How is UHV performance guaranteed?
A: Special sintering process achieves lower outgassing than most metals
Get in Touch
Have questions about our products or want to discuss a custom order? Our team is ready to help you.