Semiconductor Silicon Wafer Cleaner with 40KHz-80KHz Ultrasonic Frequency and 60℃ Temperature Control for Precision Surface Cleaning
Price:
￥800000
MOQ:
1
Delivery Time:
30-60work days
Brand:
Jietai
Product Description
Engineered specifically for semiconductor manufacturing, this precision cleaning system integrates multi-stage ultrasonic processes to meet stringent surface purity requirements of silicon wafers, ensuring minimal particle contamination and residual removal critical for wafer fabrication.
Core Cleaning Processes
Ultrasonic Alkaline Cleaning
Utilizes alkaline chemistry combined with ultrasonic energy to effectively remove organic contaminants, photoresist residues, and large particulate matter from wafer surfaces, preparing substrates for subsequent processing.
Ultrasonic Acid Cleaning
Targets inorganic impurities including metal ions and oxides through acid-based ultrasonic treatment, leveraging cavitation effects to dislodge submicron contaminants embedded in wafer textures or patterned structures.
DI Water Rinsing
Final stage employs high-purity deionized water for thorough rinsing, eliminating residual cleaning agents and ensuring surface neutrality for post-cleaning wafer handling and processing.
Technical Specifications
| Ultrasonic Frequency | 40KHz-80KHz (multi-frequency adjustable) |
|---|---|
| Operating Temperature | 60℃ (precision-controlled) |
| Material Compatibility | PVDF, quartz, and 316L stainless steel components |
Key Advantages
- Achieves sub-10nm particle removal efficiency, compliant with SEMI standards
- Multi-frequency ultrasonic configuration adapts to diverse cleaning requirements
- Closed-loop temperature control ensures process repeatability
- Integrates seamlessly into semiconductor front-end and back-end manufacturing lines
Applications
Ideal for cleaning silicon wafers in IC manufacturing, MEMS fabrication, and semiconductor packaging processes, where surface integrity directly impacts device performance and yield.
Product Images
Keywords: Semiconductor wafer cleaner, ultrasonic alkaline/acid cleaning, DI water rinsing, 40-80KHz, 60℃ temperature control, silicon wafer processing
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Get in Touch
Have questions about our products or want to discuss a custom order? Our team is ready to help you.
Company
guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.
Location
2nd Floor, Unit 2, Building 16, No. 7, Science and Technology Avenue, Houjie Town, Dongguan City, Guangdong Province
Contact Person
Leonard