40KHz-80KHz Semiconductor Silicon Wafer Cleaner with 60℃ Temperature Control and 99.9% Particle Removal Efficiency
Price:
￥800000
MOQ:
1
Delivery Time:
30-60work days
Brand:
Jietai
Product Description
Semiconductor Silicon Wafer Cleaning System
High-precision ultrasonic cleaning system designed for semiconductor manufacturing, combining multi-stage processes to meet rigorous surface purity demands for silicon wafers.
Multi-Stage Cleaning Process
- Ultrasonic Alkaline Cleaning: Removes organic contaminants, photoresist residuals, and particulate debris using 40-80KHz cavitation
- Ultrasonic Acid Cleaning: Targets inorganic impurities including metal ion contaminants and native oxide layers
- Pure Water Rinsing: Final stage uses ultra-pure water (≥18.2MΩ*cm) to eliminate residual cleaning agents
Technical Specifications
| Ultrasonic Frequency | 40KHz-80KHz (variable frequency output) |
|---|---|
| Operating Temperature | 60℃ precision-controlled |
| Material Construction | PFA and high-purity quartz components |
| Wafer Compatibility | 6-inch to 12-inch silicon wafers |
Performance Advantages
≥99.9% Particle Removal Efficiency for particles ≥0.1μm, compliant with SEMI standards
- Multi-frequency ultrasonic configuration adapts to various wafer types including 7nm technology nodes
- 60℃ temperature regulation ensures consistent cleaning results across batch operations
- Compatible with automated wafer handling systems (SMIF pods, FOUPs)
Application Scope
Essential for pre-lithography, post-CMP (Chemical Mechanical Polishing), and pre-metallization cleaning in semiconductor production lines.
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Get in Touch
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Company
guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.
Location
2nd Floor, Unit 2, Building 16, No. 7, Science and Technology Avenue, Houjie Town, Dongguan City, Guangdong Province
Contact Person
Leonard