guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.
                                                                                                           
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Since 2005
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Semiconductor Silicon Wafer Cleaner with 40KHz-80KHz Ultrasonic Frequency and 60℃ Temperature Control for 4-12 Inch Wafers

Price Negotiable
Price: ¥800000
MOQ: 1
Delivery Time: 30-60work days
Brand: Jietai
Product Description
Semiconductor Silicon Wafer Cleaning System
High-precision cleaning equipment specifically engineered for the semiconductor industry, integrating multi-stage ultrasonic processes to achieve ultra-clean surfaces on silicon wafers for microelectronic device manufacturing.
Core Cleaning Process
Ultrasonic Alkaline Cleaning
Utilizes ultrasonic cavitation in alkaline solutions to efficiently remove organic contaminants, photoresist residues, and large particulate matter from wafer surfaces and microstructures.
Ultrasonic Acid Cleaning
Employs ultrasonic energy in acidic media to eliminate inorganic impurities, including metal ions (Fe, Cu, Ni) and oxide layers, dislodging submicron contaminants.
Pure Water Rinsing
Final stage uses high-purity water (resistivity ≥18.2MΩ*cm) to thoroughly rinse away residual cleaning agents, meeting strict semiconductor purity standards.
Technical Specifications
Parameter Specification
Ultrasonic Frequency 40KHz-80KHz (adjustable)
Operating Temperature 60℃
Particle Removal Down to 0.1μm
Water Purity ≥18.2MΩ*cm resistivity
Wafer Compatibility 4-inch to 12-inch wafers
Key Advantages
  • Exceptional particle removal efficiency meeting SEMI standards
  • Complete cleaning cycle with alkaline, acid, and pure water stages
  • Adjustable frequency range (40KHz-80KHz) for process flexibility
  • Precise temperature control at 60℃ for optimal performance
  • Corrosion-resistant construction with PFA and high-purity quartz
  • Easy integration with automated wafer handling systems
Applications
Ideal for silicon wafer cleaning in pre-lithography, post-etching, and pre-deposition processes for 4-inch to 12-inch wafer fabrication, suitable for both R&D and mass production environments.
Product Images
Semiconductor silicon wafer cleaner equipment overview Wafer cleaning system internal components Semiconductor wafer cleaner control panel Wafer processing chamber detail Semiconductor cleaning system side view Wafer cleaner technical specifications display
Keywords: Semiconductor silicon wafer cleaner, ultrasonic alkaline cleaning, ultrasonic acid cleaning, pure water rinsing, 40KHz-80KHz, 60℃, wafer surface treatment

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Have questions about our products or want to discuss a custom order? Our team is ready to help you.

Company guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.
Location 2nd Floor, Unit 2, Building 16, No. 7, Science and Technology Avenue, Houjie Town, Dongguan City, Guangdong Province
Contact Person Leonard

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