40KHz-80KHz Semiconductor Silicon Wafer Cleaner with Ultrasonic Alkaline/Acid Cleaning and 60℃ Operation
Price:
￥800000
MOQ:
1
Delivery Time:
30-60work days
Brand:
Jietai
Product Description
Semiconductor Silicon Wafer Cleaning System
This high-performance cleaning system is engineered for semiconductor silicon wafer processing, integrating multi-stage ultrasonic technologies to achieve ultra-high surface purity essential for advanced microelectronics manufacturing.
Comprehensive Cleaning Process
Ultrasonic Alkaline Cleaning
Utilizes 40KHz-80KHz ultrasonic energy in alkaline solution to effectively remove organic contaminants, photoresist residues, and larger particulate matter from silicon wafer surfaces and intricate structures.
Ultrasonic Acid Cleaning
Employs the same adjustable frequency range in acidic medium to target and eliminate inorganic impurities, including metal ions and oxide layers.
Pure Water Rinsing
Final stage uses high-purity water with resistivity ≥18.2MΩ*cm to thoroughly rinse away residual cleaning agents, ensuring wafer surface integrity.
Technical Specifications
| Parameter | Specification |
|---|---|
| Ultrasonic Frequency | 40KHz-80KHz (adjustable) |
| Operating Temperature | 60℃ |
| Material Construction | PFA and high-purity quartz components |
| Particle Removal | Down to 0.1μm |
Key Advantages
- Exceptional particle removal efficiency meeting SEMI standards
- Complete synergistic cleaning cycle for comprehensive contaminant removal
- Adjustable frequency range and stable 60℃ operation for customization
- Seamless integration with automated wafer handling systems
Application Scope
Ideal for cleaning silicon wafers in 4-inch to 12-inch semiconductor manufacturing processes, including pre-diffusion, pre-lithography, post-etching, and pre-metallization stages.
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Get in Touch
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Company
guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.
Location
2nd Floor, Unit 2, Building 16, No. 7, Science and Technology Avenue, Houjie Town, Dongguan City, Guangdong Province
Contact Person
Leonard