4L Vacuum Plasma Cleaning Machine 300W Benchtop Plasma Cleaner
Vacuum Plasma Cleaning Machine Benchtop Plasma Cleaner
1.Industrial application
Semiconductor/Electronics : Clean chip, remove photoresist, improve bond strength.
Medical devices : Activated polymer materials (e.g. catheters, contact lenses) to enhance biocompatibility.
Automotive industry : dealing with the surface activation of rubber seals and headlights before bonding.
Packaging/printing : Improve the printing adhesion of plastic films.
Research : Surface modification of materials, fabrication of nanostructures.
Vacuum Plasma Cleaning Machine Benchtop Plasma Cleaner
2. Advantages
Environmental protection : No chemical solvent, reduce pollution.
Non-destructive : works only at nanoscale depth on the surface without damaging the substrate.
Efficient: Short processing times (seconds to minutes).
Versatile : works with a wide range of gases and materials (metals, plastics, ceramics, etc.)
| Model number | HY-V4 |
| Use of power | 220V |
| power | 300W |
| frequency | 40Khz IF /13.56Mhz RF (optional) |
| Dimensions of equipment | Length 630mm width 500mm height 480mm |
| Size of load | Length 220mm width 110mm height 90mm |
| Size of cavity | The diameter is 148mm and the depth is 266mm |
| volume | 4L |
| Mode of control | PLC+ touch screen can be switched automatically and manually |
| Gas channel | 2 way |
| Gas available | Oxygen, nitrogen, argon and other mixed gases |
| Vacuum pump pumping speed | 6L/S |
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