EDI Integrated Deep Water Desalination Equipment High Purity Ultrapure Output Eco Friendly Operation
This integrated two-stage reverse osmosis plus EDI deep desalination system is specially designed for electronic manufacturing. It thoroughly removes soluble salts, micro-particles, organics and microorganisms from raw water. No acid and alkali chemical regeneration is required during operation. The produced ultra-pure water reaches ultra-high purity standard, effectively avoiding electronic product short circuit, blemish and poor conductivity caused by ionic impurities, perfectly matching wafer, circuit board, chip and precision electronic production.
Two-stage RO removes most dissolved solids, and EDI performs deep ion removal. The finished water resistivity hits 15-18.25MΩ*cm, satisfying strict cleaning requirements for semiconductor and precision electronic processes.
EDI continuously separates ions by electric field instead of traditional mixed bed resin regeneration. Zero acid/alkali waste discharge, lowering wastewater treatment pressure and meeting factory environmental compliance standards.
Equipped with PLC touch control cabinet, supporting automatic RO membrane flushing, real-time online monitoring of resistivity, conductivity, pressure and flow. Multiple fault alarm functions enable stable 24-hour non-stop running.
Pretreatment, double-stage RO unit and EDI module are assembled on an integrated stainless steel frame. It occupies small workshop space and realizes fast on-site installation and commissioning.
High overall water recovery rate cuts raw water consumption. EDI only consumes low electric power, saving recurring costs of chemicals, labor and waste liquid treatment.
Raw water tank → Raw water pump → Quartz sand filter → Activated carbon filter → Water softener → Anti-scalant dosing device → 5μm security filter → First-stage high-pressure pump → First-stage RO system → Intermediate water tank → Second-stage high-pressure pump → Second-stage RO system → EDI deep desalination stack → Ultrapure water tank
- Double-stage RO: Mass desalination to reduce total salt content and protect EDI from organic fouling
- EDI stack: Deep deionization to produce high-resistivity ultra-pure water
- Optional post-processing: UV sterilizer, polishing mixed bed to further reduce bacteria and micro-particles
| Parameter | Specification |
|---|---|
| Water Yield Range | 0.5m³/h to 60m³/h (customized) |
| RO Membrane Desalination Rate | ≥98% |
| Product Water Resistivity | 15-18.25MΩ*cm |
| Total System Water Recovery | 70%-80% |
| Working Temperature | 10℃-40℃ |
| Standard Power Supply | 380V/50Hz |
| Construction Materials | Industrial anti-fouling 8040 RO membranes, standard industrial EDI stacks, 304/316 stainless steel frame and pipelines |
- Semiconductor wafer etching, cutting and cleaning process water
- PCB circuit board development, electroplating and washing water
- Chip packaging, microelectronic component precision cleaning
- LCD panel, lithium battery production ultra-pure water supply
- Electronic laboratories, precision testing instrument supporting ultra-pure water
Adjust equipment flow rate and add polishing filters according to factory water quality and production standards.
Core spare parts including high-pressure pumps, PLC control system, RO membranes and EDI modules enjoy one-year warranty. Lifelong free technical support is available for installation, debugging and daily maintenance.
We supply operation manuals, layout drawings and overseas remote commissioning guidance for global buyers.
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