Wafer Level Hysteresis Loop Instrument Non Destructive Wafer Measurement System
Using polar/longitudinal magneto-optical Kerr effects (MOKE), this instrument rapidly and globally detects the magnetism of wafer films. Non-contact measurement avoids wafer damage and is suitable for post-patterning sample testing in spin chip production. It provides a vertical magnetic field of up to 2.5 T and an in-plane magnetic field of up to 1.4 T, with strong magnetic fields inducing free and reference layer flipping in vertically anisotropic magnetic access random memory (MRAM) film stacks. Ultra-high Kerr detection sensitivity allows single-time characterization of subtle magnetic changes in different film layers. Combining laserpoint-by-point probing with scanning imaging enables rapid creation of global wafer magnetic characteristic maps, aiding process optimization and yield control.
| Equipment Performance Indicator | Description |
|---|---|
| Sample Size | Compatible with 12-inch and below, supports fragment testing |
| Magnetic Field | Vertical ±2.4 T; In-plane ±1.3 T |
| Magnetic Field Resolution | PID closed-loop feedback regulation, 0.01 mT |
| Magnetic Field Uniformity | Better than ±1%@Φ1 mm |
| Kerr Angle Resolution | 0.3 mdeg (RMS) |
| Testing Efficiency | 12 WPH@±1.3 T /9 sites measurement/200 mm wafer |
| Sample Repeatability | Better than 10 μm |
| Uptime | 90% |
| EFEM | Optional |
| Testing Functions | Non-destructive hysteresis loop measurement of magnetic film stacks/devices, automatic extraction of hysteresis loop information (free layer and pinned layer Hc, Hex, M (Kerr angle value)), and rapid mapping of wafer magnetic characteristic distribution |
Hysteresis Loop Measurement Results of Vertical MRAM Film Stacks
Hysteresis Loop Measurement Results of In-Plane Anisotropic mTJ Film Stacks
Different Scanning Modes
Magnetic Field Characteristic Distribution Map of 12-inch Vertically Anisotropic Wafer
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