Multilayer Al2O3 Alumina Ceramic Ring For Semiconductor Hermetic Seal Plasma Resistance
Price:
Customization
MOQ:
100
Delivery Time:
20-30 working days
Brand:
XQCERA
Product Description
Multilayer Alumina (Al₂O₃) Ceramic Ring for Semiconductor Applications
High-performance multilayer alumina ceramic rings engineered specifically for semiconductor manufacturing processes. These components deliver exceptional plasma resistance, hermetic sealing capabilities, and ultra-high purity required for demanding etch and CVD chamber applications.
High-purity Al₂O₃ ceramic construction for semiconductor-grade applications
Superior plasma resistance in aggressive etch and CVD environments
Reliable hermetic sealing properties for chamber integrity
Multilayer design for enhanced mechanical and thermal performance
Excellent dielectric properties and thermal stability
Material:
High-Purity Alumina (Al₂O₃)
Construction:
Multilayer Ceramic
Application:
Semiconductor Process Chambers
Process Compatibility:
Etch, CVD, Plasma Processes
Primary Applications:
Etch chamber components, CVD system seals, plasma processing equipment, semiconductor manufacturing tools, and high-vacuum applications requiring reliable ceramic performance.
Similar Products
Get in Touch
Have questions about our products or want to discuss a custom order? Our team is ready to help you.
Company
Hunan Xiaoqing Ceramics Co., Ltd.
Location
Huadan Industrial Park, No. 628, Xianglu Avenue, Ludou District, Zhuzhou City, Hunan Province,China
Contact Person
Katherine Huang