Laboratory Heating Equipments

Factory price of 1200.C vacuum atmosphere muffle furnace with gas mixer A.vacuum atmosphere muffle furnace can protect material from oxidation and decarburization with flowing Nitrogen, Argon and other inert gas. B.vacuum atmosphere muffle furnace is an ideal heat treatment furnace for sintering, reducing with inert-atmosphere in the labs of university, Research Institution and industrial company. Advantage of vacuum atmosphere muffle furnace A: Better leak tightness and

Factory price of 1400.C vacuum atmosphere muffle furnace with gas mixer A.vacuum atmosphere muffle furnace can protect material from oxidation and decarburization with flowing Nitrogen, Argon and other inert gas. B.vacuum atmosphere muffle furnace is an ideal heat treatment furnace for sintering, reducing with inert-atmosphere in the labs of university, Research Institution and industrial company. Advantage of vacuum atmosphere muffle furnace A: Better leak tightness and

Factory price of 1200.C vacuum atmosphere muffle furnace with gas mixer A.vacuum atmosphere muffle furnace can protect material from oxidation and decarburization with flowing Nitrogen, Argon and other inert gas. B.vacuum atmosphere muffle furnace is an ideal heat treatment furnace for sintering, reducing with inert-atmosphere in the labs of university, Research Institution and industrial company. Advantage of vacuum atmosphere muffle furnace A: Better leak tightness and

CVD tube furnae system with two zone tube furnace for growing semiconducting materials by CVD technique Description of the CVD tube furnace system: The GK-1200CVD series furnace workstation consists of an GK-OTF-1200II series two zone tube furnace, a precision mass flow gas control station, a vacuum station and other assembling parts. The max. working temperature of this workstation is 1200°C. The ultimate vacuum rate goes to 10^-5 torr (with our turbo pump system). The mass

1500ºC Max. Vacuum Heated Pressing Furnace with 4" Mullite Tube and Water Cold Flange - OTF-1500X-VHP4 OTF-1500X-VHP4 is designed for making dense compound materials under both vacuum & high pressure, and/or bounding multi-layer wafer together under a pressure up to 5 metric tons up to 1500ºC. It is integrated with a split vertical tube furnace with a vacuum-sealed 4" mullite tube, one set of 0.5 " ID graphite pressing die, and 20T electric hydraulic press. The furnace can be