99.97% High Purity Molybdenum Sputtering Target For PVD Coating Planar Mo Target

Name: 99.97% High Purity Molybdenum Sputtering Target For PVD Coating Planar Mo Target
Uploaded: Mar 04, 2021
Duration: 21 s
Description: Watch 99.97% High Purity Molybdenum Sputtering Target For PVD Coating Planar Mo Target video by Zhengzhou Sanhui Refractoryu00a0Metal Co., Ltd. on bjjsgy.com. Learn more about our products and factory operations.

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2021-12-29

Molybdenum Sputtering Target mo1 metal sputtering targets moly sputtering targets

Discover the High Purity 99.8% Titanium Sputtering Target for Vacuum Magnetic Control, designed to enhance film performance with superior purity and density. Ideal for vacuum coating applications, this titanium target ensures high-quality sputtered films with excellent electrical and optical properties.