Sputtering Targets

99.95% High Quality Chromium Sputtering Target for Vacuum Coating Specification of Chromium Target Chromium Products Grade: Cr1, Cr2 Production Standard Size Chromium bar /rod ASTMB456 dia(6-120mm)*(50-2500mm) Chromium wire ASTMB456 dia(0.5-6mm)*L Chromium plate /sheet ASTMB168 (thkness1.0-35mm)*(W50-500mm)*(L10-2000mm) Chromium tube/pipe ASTMB408 OD(6-100mm)*(L50-3000mm) Chromium foil ASTMB168-98 thkness0.05-6mm*W20-150mm*L Name of Material Chemical Composition (percentage

High Purity Silver Good Corrosion Resistance Chromium Target,Silver Sputtering Target Chromium (Cr) General Information: Chromium is one of the most popular metals in the world. Chromium is a silvery, lustrous, hard, and brittle metal known for its high mirror polish and corrosion resistance. It has a melting point of 1,857°C, a density of 7.2 g/cc, and a vapor pressure of 10-4 Torr at 1,157°C. Its name comes from the Greek word "chroma", which means color, due to its very

99.99% High Purity Diameter 25-400 Tantalum Sputtering Target 1. Product name Tantalum Target 2. Purity 99.9~99.99% 3. Standard ASTM B708 4. Thickness 0.8mm - 30mm 5. Application Used for numerous heating element application 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-qualified product being out from our company. 7. Certification Report: Material Certification,CE,SGS, or testing report will be offered. 8.

High Purity 99.99% ITO Targets In2O3:SnO2=90:10 wt% Application In terms of application, ITO transparent conductive film glass is mainly used in LCD field, industrial field, transportation and other fields. In the field of LCD, ITO glass has a wide range of applications and has long been used in the LCD display of calculators, electronic watches and other equipment. With the development of electronic technology, ITO glass has been gradually applied in notebook computers, word

Customized polished or grinding surface High purity 99.95 NiV7 nickel vanadium sputtering target Instruction of Nickel Vanadium Sputtering Target: Nickel Vanadium (NiV7wt%) sputtering target Available purity: 99.9% 99.95% Dimension: can make according to your request Available shape: round, rectangular Density: 8.62g/cm3 Application in Semiconductors & Micro-electronics industry, Solar photovoltaic industry COA( Certificate of Analysis) is available here Specification of

99.99% Min Magnesium Sputtering Targets Ground Material: Magnesium/Mg Available purity: 99.9%, 99.95%, 99.99% Size: customized Application: PVD coating Product Name Purity Density Surface Processing Mg Target 99.99% 1.74g/cm3 ground smelting Properties of Magnesium Sputtering Targets Vacuum sputtering target materials and optical coating materials are widely used in decorative coating, tool coating, optical coating, coated glass industry and flat panel display industry. The

Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. Zirconium has good corrosion resistance in nitric acid not more than 90% below 200℃. However, the stress corrosion cracking sensitivity of zirconium in nitric acid should be noted. Zirconium is resistant to corrosion in all caustic

99.95%-99.99% High Purity Bright Surface Tantalum Sputtering Targets 1. Product name Tantalum Target 2. Purity 99.95~99.99% 3. Standard ASTM B708 4. Thickness 0.8mm - 30mm 5. Application Used for numerous heating element 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-qualified product being out from our company. 7. Certification Report: Material Certification,CE,SGS, or testing report will be offered. 8.

99.99% Aluminum Vacuum Magnetron Sputtering Used for PVD Coating Introduction: Product material 99.99% Al Specifications Round, rectangular. special-shaped Process vacuum magnetic levitation melting-casting into ingot-mechanical processing Price According to product raw material ratio and size Specifications: Material Al Size 2" dia.x 0.12mm, 4N/5N 47mm dia.x 0.12mm, 4N/5N 7mm dia.x0.12mm, 4N/5N or customized size Purity 99.99%/99.999% Package vaccum packing Welcome to

Sputtering Target Metal Sputtering Targets 99.9% High Purity Coating Materials Zirconium Sputtering Targets sputtering targets: Thickness: 0.04 to 1.40" (1.0 to 35mm). Width up to 20"(50 to 500mm). Length: 3.9" to 6.56 feet( 100-2000mm) other sizes as requested. Cylinder sputtering targets: 3.94 Dia. x 1.58"(100 Dia. x 40mm) 2.56 Dia. x 1.58" (65 Dia. x 40mm) or 63*32mm other sizes as requested. Tube sputtering targets: 2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L

Zirconium Sputtering Target, Zirconium Target are available in varying sizes Grades: R60702, 99.2%min Purity: 99.5% Purity: 99.95% Hf

High Purity 99.999% Si Vacuum Magnetic control Sputtering Targets Specification Product name Silicon sputtering target Symbol Si sputtering target Manfucture method Czochralski method Size Round: Dia 1mm Plate: L99% Purity 99.999% Typical product Si/Al 90/10%,Si/Al 1/99%,Si/Al 0.5/99.5% Grain size

High Purity Silver Good Corrosion Resistance Chromium Sputtering Target Specifications 1. Chromium Target 2. Density:7.19g/cm3 3. Purity:99.5%,99.7%,99.9%,99.95% 4. Thickness:1.0mm -35.0mm 5. Standard:ASTM, ISO900 Pure chromium - or maybe an alloy? It's your choice. We prepare our chromium to perform perfectly in every application. We can determine the following properties through the addition of various alloys: - Physical properties (e.g. melting point, vapor pressure,

High Purity 99.8% Vacuum Magnetic Control Titanium Sputtering Target Purity is one of the main performance indicators of the titanium target, because the purity of the target has a great influence on the performance of the film. Our titanium target has high purity of 99.8%. In order to reduce the pores in the target and improve the properties of sputtered films, the target with high density is usually required. The density of the target not only affects the sputtering rate,

High Pure 99.95% Chromium Rectangular Sputtering Targets on Sale Purity is one of the main performance indicators of the chromium target, because the purity of the target has a great influence on the performance of the film. Our chromium target has high purity of 99.95%. In order to reduce the pores in the target and improve the properties of sputtered films, the target with high density is usually required. The density of the target not only affects the sputtering rate, but

99.99% Aluminum Vacuum Magnetron Sputtering Used for PVD Coating Introduction: Product material 99.99% Al Specifications Round, rectangular. special-shaped Process vacuum magnetic levitation melting-casting into ingot-mechanical processing Price According to product raw material ratio and size Specifications: Material Al Size 2" dia.x 0.12mm, 4N/5N 47mm dia.x 0.12mm, 4N/5N 7mm dia.x0.12mm, 4N/5N or customized size Purity 99.99%/99.999% Package vaccum packing Welcome to

99.5% High Purity Zirconium Sputtering Target For Pvd Coating Zirconium Sputtering Target, Zirconium Target are available in varying sizes Grades: R60702, 99.2%min Purity: 99.5% Purity: 99.95% Hf

Best Selling Nickel Sputtering Target Supplying Product name Nickel Sputtering Target Purity 99.6~99.9% Standard ASTM B162 Thickness 0.2mm - 30mm Application Used for numerous heating element application Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-qualified product being out from our company. Chemical Compositions Chemical Composition and Property of Ni4 nickel sputtering target Ni+Co Fe Cu Si Mn C Mg Total

PVD Coating High Purity 99.95% Chrome Sputtering Targets Round Target Quick Details of Chrome Sputtering Targets: Model Number: Cr1, Cr2 Application: combustion equipment, Aero-Space, Jewellery imensions: Dia: 6.0mm-100mm Chemical Composition:99.5%,99.7%,99.9%,99.95% Purity: 7.19 g/cm3 Diameter: 6.0mm - 100mm Length: 30mm - 2000mm Conditions: pure Cr / alloy Surface: bright & smooth Processing: forged, grounded Packaging & Delivery Specifications of Chrome Sputtering Targets:

Bright Surface High Purity Tantalum Sputtering Target 1. Product name Tantalum Target 2. Purity 99.9~99.99% 3. Standard ASTM B708 4. Thickness 0.8mm - 30mm 5. Application Used for numerous heating element application 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-qualified product being out from our company. 7. Certification Report: Material Certification,CE,SGS, or testing report will be offered. 8. Chemical