High Purity Titanium Sputtering Target 85 X 35 ISO9001

High Purity Titanium Target Φ85×35

Heat treatment:

Structural Development of Titanium Targets

The first stage:

Early chip foundries had high profit margins. They mainly use 100-150mm magnetron sputtering machines with less power. The sputtered film is thick and the chip size is large. At that time, titanium targets for integrated circuits were mainly 100-150mm single and composite targets.

The next phase:

In the third stage, with the development of integrated circuits, the width of the chip lines is further narrowed. At this time, chip foundries mainly use 200-300mm sputtering machines, and the requirements for targets are more stringent. During this period, Ti targets were mainly made by diffusion welding of copper alloy backplanes.

Description:

Competitive Advantage:

With complete processing equipment, strong technical strength and abundant R&D resources, we are willing to grow together with customers as solid partners, and provide customers with better technical assistance and advice to help them stand out in the fiercely competitive market.             

Applications:

Titanium's high strength, low density, and corrosion resistance are leading to increased use of titanium in various industries such as aerospace, chemical, petrochemical, offshore oil and gas, power generation, desalination and generally over the past 40 years, combined with engineering, and biomedicine . It is no longer considered a new metal or unusual only for aerospace applications, but is only available to design engineers as a high performance material. Titanium is a new metal. Because of its excellent properties, it is widely used in industrial production such as aviation, aerospace, chemical industry, petroleum, metallurgy, light industry, electric power, seawater desalination, ships and daily life appliances. for modern metal.

More recently, titanium is used in many of the goods we use, such as sports, building materials, medical applications and accessories