Titanium Sputtering Target
Medical Titanium Target Material , Special Denture Processing Material
PRODUCT DESCRIPTION Medical Titanium Target Material, Special Denture Processing Material Heat Treatment The coating target is a sputtering source that forms various functional thin films on the substrate by sputtering under appropriate process conditions through magnetron sputtering, multi-arc ion plating or other types of coating systems. To put it simply, the target is the target material bombarded by high-speed energetic particles. It is used in high-energy laser weapons.
Grade 5 Titanium Sputtering Target 99.98% polished Surface
Product Description Grade 5 titanium sputtering target Titanium (Ti) General Information Titanium is a common material found in a myriad of products including watches, drill bits, laptops, and bicycles, just to name a few. In pure form, it is lustrous and silvery-white in appearance. It has a melting point of 1,660°C, a density of 4.5 g/cc, and a vapor pressure of 10-4 Torr at 1,453°C. It is a sturdy material which is easily fabricated when heat is applied. Its strong,
High Purity Titanium Sputtering Target 85 X 35 ISO9001
High Purity Titanium Target Φ85×35 Heat treatment: Structural Development of Titanium Targets The first stage: Early chip foundries had high profit margins. They mainly use 100-150mm magnetron sputtering machines with less power. The sputtered film is thick and the chip size is large. At that time, titanium targets for integrated circuits were mainly 100-150mm single and composite targets. The next phase: In the third stage, with the development of integrated circuits, the
TA1 Round Titanium Sputtering Target 100 X 40
TA1 Titanium Target Φ100×40 Heat treatment: Metal titanium and titanium sputtering targets are basically the same, and both are composed of titanium. The difference is that titanium metal is more like raw materials, while titanium targets are more like titanium products. Titanium can be used as a raw material to make titanium sputtering targets by several methods, and they are widely used in high-tech fields such as electronics, information industry, home decoration, and
80 X 40 Titanium Sputtering Target For Mechanical Industrial
Spot Titanium Target Φ80×40 Heat treatment: Structural Development of Titanium Targets The first stage: Early chip foundries had high profit margins. They mainly use 100-150mm magnetron sputtering machines with less power. The sputtered film is thick and the chip size is large. At that time, titanium targets for integrated circuits were mainly 100-150mm single and composite targets. second stage: In the second stage, the chip line width is narrowed according to Moore's Law.
Flat Titanium Sputtering Target Plate Alloy Rotary Ingot Corrosion Resistance
Titanium Target Alloy Titanium Plate Titanium Ingot Titanium Alloy Titanium Rotary Target Titanium Flat Target Heat Titanium has strong corrosion resistance in many media, especially in neutral and oxidizing media. concentration of nitric acid. It has good corrosion resistance to most alkaline solutions, such as saturated solutions of barium hydroxide, calcium hydroxide and magnesium hydroxide at room temperature, but cannot be used for boiling sodium hydroxide solutions.
Custom Dimensions Sputtering 99.99% Titan Sputtering Target Pipe
Custom Dimensions Titanium Target , High Purity 99.99% Sputtering Target Heat Treatment Titanium alloys are heat treated for a number of reasons, the main ones being to increase strength by solution treatment and aging as well as to optimize special properties, such as fracture toughness, fatigue strength and high temperature creep strength. Alpha and near-alpha alloys cannot be dramatically changed by heat treatment. Stress relief and annealing are the processes that can be
High Purity 99.99% Titanium Sputtering Target High Hard Sputtering Target
High Purity 99.99% Titanium Sputtering Target High Hard Texture Custom Dimensions Competitive Advantage: Our company is located in Baoji who has another name called titanium city .We are the professional manufacturer who manufacture high competitive titanium products. We have more than ten years of experience in building titanium’s factory,which includes almost one thousand employees. we strictly control every process of production and strive to provide customers with high
OEM Sputtering Materials FOB 1500mm CNC Machining Titanium Round Tube Target
OEM Titanium Sheet Metal , CNC Machining Sputtering Materials Low Impurity Content Description: Name titanium target Shape Square /round, according to your request Available size Round: dia 25~250mm Rectangular: length up to 1500mm Customization is available Proportion(wt%) 5-80 ± 0.2Ti at your request. Impurity content low Certificates ISO9001:2008, the third test report Technics Vacuum melting Application widely used in coating processing industries a: architectural glass,
Gr2 Rotatable Sputtering Targets Dia 25mm Titanium Sputtering Target Tube
Heat Dissipation Titanium Sputtering Target Pipe Thin Film For Coating Dia 25~250mm Widely used in heat exchange equipment, such as tubular heat exchangers, coil heat exchangers, serpentine heat exchangers, capacitors, evaporators and conveying pipes, etc. Many nuclear power industries use titanium tubes as standard tubes for their units. Description: Name titanium target Shape Square /round, according to your request Available size Round: dia 25~250mm Rectangular: length up
Ti6Al4V Industry Titanium Target Gr5 Titanium Alloy High Hard Texture
Industry Titanium Target , Titanium Alloy CNC Machining High Hard Texture Ti-6Al-4V is the most widely used titanium alloy because it can be heat treated to different strength levels, is easy to weld, and is relatively easy to machine. The many uses for Ti-6Al-4V include blades and discs for aircraft turbines and compressors, rocket engine casings, marine components, steam turbine blades, structural forgings and fasteners. To improve durability, a range of thermal, mechanical
CNC Machining Gr1 Titanium Sputtering Target OEM Shape Titanium Target
CNC Machining Titanium Sputtering Target OEM Square Round Low Impurity Content Grade 1 is the most ductile and softest titanium alloy. It is a good solution for cold forming and corrosive environments.ASTM/ ASME SB-265 provides the standards for commercially pure titanium sheet and plate. Grade 2 Unalloyed titanium, standard oxygen. Description: Name titanium target Shape Square /round, according to your request Available size Round: dia 25~250mm Rectangular: length up to
Industry 99.99% Titan Metal Sputtering Targets Gr2
Industry Titanium Sheet Metal , Sputtering Materials Vacuum Melting Electronic Description: Name titanium target Shape Square /round, according to your request Available size Round: dia 25~250mm Rectangular: length up to 1500mm Customization is available Proportion(wt%) 5-80 ± 0.2Ti at your request. Impurity content low Certificates ISO9001:2008, the third test report Technics Vacuum melting Application widely used in coating processing industries a: architectural glass, car
Length 1500mm Tio2 Sputtering Target ISO9001
Sputtering Round Titanium Sputtering Target Low Impurity Content Semiconductor Field Competitive Advantage: Our company is located in Baoji who has another name called titanium city .We are the professional manufacturer who manufacture high competitive titanium products. We have more than ten years of experience in building titanium’s factory,which includes almost one thousand employees. we strictly control every process of production and strive to provide customers with high
Gr7 Titanium Tungsten Sputtering Target 30mm
High Density Titanium Sputtering Target 4.506-4.516g/Cm3 Corrosion Resistance Titanium Sputtering Target Introduction The density of titanium is 4.506-4.516g/cm3, melting point is 1668oC,boiling point is 3535oC. In the appropriate oxidizing environment also has excellent corrosion resistance. Therefore, products are widely used in aerospace structural materials, such as aircraft, rockets, missiles and spacecraft, ship manufacture, chemical industry, conventional weapons,
PVD Rotary Targets Titanium Gr1 Gold Sputtering For Mould Field
Mould Field Titanium Target , Sputtering Target Thin Film For Coating Description: Name titanium target Shape Square /round, according to your request Available size Round: dia 25~250mm Rectangular: length up to 1500mm Customization is available Proportion(wt%) 5-80 ± 0.2Ti at your request. Impurity content low Certificates ISO9001:2008, the third test report Technics Vacuum melting Application widely used in coating processing industries a: architectural glass, car using
Anti Corrosion Titanium Sputtering Target AMS 4928 Polished Titanium Disc
Anti Corrosion Titanium Disc , Polished Titanium Material Sputtering Target Description: Product Name Titanium Sputtering Target Gr1 Gr2 PVD pure titanium target Material Pure titanium/Titanium alloy Color Sliver Diameter Diameter30-2000mm,Thickness3.0-300mm or as the clients request Grade Gr1 Gr2 Gr5 Gr7 Packing Export standard package with polywood case Standard ASTM B381/348,F67/136,AMS 4928 Process Forged , Rolling , Grinding Applications: Widely used in coating
40mm Ti Sputtering Target Materials ISO 9001 Chemical Titanium Target
Forged Titanium Sputtering Target Round Shape For Chemical Engineering Six Characters of Titanium 1. High Strength Titanium strength/density ratio is better than other metals, components with high strength, good rigity, less weight can be made out of titanium. Titanium is applied for aircrafts engines, frames, skins, fastners and landing gears. 2. Anti-Corrosion Compared with stainless steel, titanium alloy's corrosion is better in moisture laden air, seawater, titanium
GR12 Titanium Sputtering Target Thickness 3mm Titanium Aluminum Alloy Plate
Titanium Sheet Metal Target , Grade 5 Titanium Aluminum Alloy Plate Titanium Sheet Metal Target Description: Name titanium sputtering target Material Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Standard ASTM B381; ASTM F67, ASTM F136 size 1. Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm 3. Customized is available Technique Forged and CNC Machined Product Status Annealed(M) Type Sputtering
PVD Titan Metal Sputtering Targets 99.7% Electronic Sputtering For CD ROM
99.7% PVD Shooting Titanium Sputtering Target For CD-ROM , Decoration Description: Titanium Round Target Material Type Size Ti Target Ni Target Zr Target Mo Target Ti-Al Target SSTarget Round Common:Dia100*40,Dia80*40,Dia60*40 According to Customers' Requirements Plate Target Material Type Size Ti Target Ni Target Zr Target Mo Target Ti-Al Target SS Target Plate According to Customers' Requirements Applications: Titanium target is used for CD-ROM, Decoration, Flat panel