Round Gr1 Titanium Target Sputtering EXW Vacuum Melting Tio2 Sputtering Target

Round Square Target Sputtering Materials Vacuum Melting High Hard Texture

Description:

Applications:

We offers Titanium targets for all major OEM PVD systems. Through control of the target metallurgy, oxygen content, surface finish and assembly technology, targets for many wafer sizes can be made in purities. We offers titanium targets that light off easily, produce low particulate and provide consistent and repeatable thin films. our main forms of sputtering target is plate, bar, disc, pipe.

widely used in coating processing industries

a: architectural glass, car using glass, graphic display field.

b: electronic and semiconductor field.

c: decoration and mould field.

Specifications:

We also support to customize as your requiry.

Competitive Advantage:

Our company is located in Baoji who has another name called titanium city .We are the professional manufacturer who manufacture high competitive titanium products.

We have more than ten years of experience in building titanium’s factory,which includes almost one thousand employees. we strictly control every process of production and strive to provide customers with high quality products,And our products sale to all over the world.