8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
niobium target purity 99.95% merchandise on hand customization
Refined by electron-beam, niobium targets are produced from niobium ingots. The target fabrication includes: mechanical deformation, machining (trimming and plane milling), vacuum re-crystallization annealing and finishing chemical treatment.
Higher density of target material is usually required in order to reduce the stomata in the material and improve the performance of the sputter film. The density affects not only the sputtering rate, but also the electrical and optical properties of the film. The higher the density of target material is, the better the film performance works.
In addition, enhancing density and strength of the target material can withstand the thermal stress better during the sputtering process. Density is also one of the key performance indicators of the target material.
| Commodity Name | 99.95% High Purity Niobium Disc |
| Size | customizable |
| Surface | Polish and bright |
| Purity | 99.95% |
| Density | 8.6g/cm3 |
| Application | Steel, superconducting material, aerospace, atomic energy, etc |
| Advantage |
1) good superconductivity material 2) Higher melting point 3) Better Corrosion Resitance 4) Better wear-resisting |
| Technology | Powder Metallurgy |
| Lead time | according to the quantity and material |
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