W1 Tungsten Products Rotatable Lathed Tungsten Sputtering Target
Tungsten Rotatable Sputtering Target
Tungsten targets are mainly used in aerospace, rare earth smelting, electrical light sources, chemical equipment, medical equipment, metallurgical machinery, smelting equipment and petroleum etc..
PARAMETER
|
OD(mm) |
ID(mm) |
Length(mm) |
Custom Made |
|
140-300 |
120-280 |
100-3300 |
|
Model Number |
W1 |
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|
Shape |
customized |
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|
Chemical Composition |
99.95% W |
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Feature
1.High density
2.High wear-resistant
3.High thermal conductivity with low thermal expansion coefficient
4.High vibration-damping capacity and high Young’s modulus
5.High oxidation resistance and corrosion resistance
Specification
|
Atomic number |
74 |
|
CAS number |
7440-33-7 |
|
Atomic mass |
183.84 [g/mol] |
|
Melting point |
3420 °C |
|
Boiling point |
5555 °C |
|
Density at 20 °C |
19.25 [g/cm3] |
|
Crystal structure |
Body-centered cubic |
|
Coefficient of linear thermal expansion at 20 °C |
4.410-6[m/(mK)] |
|
Thermal conductivity at 20 °C |
164 [W/(mK)] |
|
Specific heat at 20 °C |
0.13 [J/(gK)] |
|
Electrical conductivity at 20 °C |
18.2106[S/m] |
|
Specific electrical resistance at 20 °C |
0.055 [(mm2)/m] |
APPLICATIONS
semiconductor
chemical vapor deposition (CVD)
physical vapor deposition (PVD) display
Get in Touch
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