Professional-grade 4-head CAD inkjet paper pattern graph contour printing plotter designed for precision industrial applications in clothing, bags, shoes, and hat manufacturing.

• High-speed Servo Control with Full Closed-loop Positioning
• Independent Output Manager with File Background Automatic Queuing Printing
• Advanced SOPC Technology Implementation
• Breakpoint Resume Function for Reliable Data Transmission
• Automatic Online Printing Capability
• 2, 3, or 4 Printing Heads Configuration Options

• Printing Speed: Two-way high speed 93 m²/h to 163 m²/h
• Printing Format: HPGL drawing language, compatible with domestic and international CAD software
• Print Resolution: 150-600 DPI adjustable
• Nozzle Type: HP45A/C51645A Type Ink Plotter
• Line Quality: Clear, smooth, seamless with optional 1-8 lines
• Nozzle Cleaning: Automatic cleaning before printing
• Paper Loading: Front heightening device supports 28cm diameter paper rolls
• Paper Feeding: Hidden infrared precise system, continuous 700 meters without deviation
• Print Media: 40-80g ordinary roll printing paper; 80-250g single brown paper
• Communication Interface: Network port for multiple computer control
• Power Supply: 220V/50Hz or 110V/60Hz optional
• Control Panel: Press key operation for simple, convenient, durable use
• Machine Structure: Die standardized metal structure for high precision and long life

Products are packed in secure wooden cases according to export standards or customer requirements.

Since its establishment, GEMEI has developed a comprehensive series of cutting machines for clothing, bags, shoes and hats, obtaining multiple software copyright and patent certificates. Our GM series cutting machines combine the essence of Chinese and foreign technologies, featuring innovative design principles focused on core performance and simplified operation.

GEMEI maintains a dedicated research and development team composed of doctors, senior engineers, and other high-quality professionals, ensuring that innovation remains the driving force behind our continuous development.