Shaper Diamond Technology Co., Ltd
                                                                                                           
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MPCVD Rough Mechanical CVD Diamond Lab Created VVS Diamond Plate 12x12x0.3mm

Price Negotiable
Price: To be negotiated
MOQ: 10pcs
Delivery Time: 7 working days
Brand: Infi
Product Description
MPCVD Rough Mechanical CVD Diamond Lab Created VVS Diamond Plate 12x12x0.3mm
Technical Specifications
Attribute Value
Hardness (microhardness) 80~150GPa
Young's modulus 1150~130OGPa
Coefficient of friction 0.05~0.05
Thermal expansion coefficient 10-.K-l
Thermal conductivity 1500-2000 w/ (m·K)
Nitrogen content <50ppm
Color Colorless
Crystal growth process CVD
Product Overview

12x12x0.3mm MPCVD Raw Large Rough Diamonds VVS Diamond Plate CVD Seeds CVD Substrate Colorless Seeds

Single crystal diamond CVD (chemical vapor deposition) refers to a type of diamond that is produced using the CVD process. In this process, a mixture of carbon-containing gases is decomposed under controlled conditions, resulting in the formation of a single crystal diamond layer on a substrate.

Key Properties

Single crystal diamond CVD is known for its exceptional hardness and thermal conductivity, which makes it useful for a range of industrial and scientific applications, such as cutting and grinding tools, heat spreaders, and optical components.

Compared to other forms of synthetic diamond, single crystal diamond CVD has a highly ordered crystal structure, which gives it improved physical and mechanical properties. This makes it a desirable material for a range of high-performance applications, where its hardness and thermal conductivity are important factors.

Manufacturing Process

Using the microwave plasma-assisted chemical vapor deposition method (MPACVD), the microwave resonance system is used to break down the carbon-containing gas and corrosive gas at low and medium pressures to generate plasma, and the growth strategy of the single-crystal diamond crystal model is designed, so that the diamond crystal can be used Homoepitaxial growth is achieved in the 100 and 110 and 111 growth directions of the type IIb diamond seed crystal.

Detailed Specifications
Suggested application: Substrate/seeds for single crystal CVD growth
Available sizes: 3x3x0.3mm to 15x15x0.3mm in various increments
Benefits:
  • Length, width and thickness are all positive tolerance
  • No polycrystalline black spots or cracks under 20x magnification
  • Perfect cutting without small missing corners
  • Uniform stress distribution under polarizer
Orientation: 4pt/100
Lateral Dimensions: Measured to smaller side
Edges: Laser Cut
Edge Orientation: <100> edges
Face Orientation: {100} faces
Tolerances: L + W (0, +0.3 mm), thickness (0, +0.1mm)
Surface Finish: Two sides polished (Ra < 20 nm), one side polished, or unpolished options
Boron Concentration [B]: <0.05 ppm
Nitrogen Concentration: < 20 ppm
Product Images
MPCVD Diamond Plate close-up view showing crystal structure MPCVD Diamond Plate under magnification showing surface details MPCVD Diamond Plate side view showing thickness and edge quality MPCVD Diamond Plate comparison showing different sizes

Get in Touch

Have questions about our products or want to discuss a custom order? Our team is ready to help you.

Company Shaper Diamond Technology Co., Ltd
Location NO431 Ruifu, Shaoshan North Road, Yuhua District ,Changsha, Hunan Province, China
Contact Person Alice Wang

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