High-Purity Alumina A998 (99.8%) Ceramic Rings for 200mm and 300mm Semiconductor Tools with Exceptional Plasma Resistance

Name: High-Purity Alumina A998 (99.8%) Ceramic Rings for 200mm and 300mm Semiconductor Tools with Exceptional Plasma Resistance
Brand: Shaanxi KeGu New Material Technology Co., Ltd

Price Negotiable

Price: 200-500 yuan/kg

MOQ: Negotiable

Delivery Time: Negotiable

Brand: KEGU

Product Description

Advanced Alumina Ceramic Rings for Semiconductor Equipment

We manufacture high-performance Alumina Ceramic Rings specifically engineered for critical applications in semiconductor plasma processing equipment. Made from High-Purity Alumina A998 (99.8%), our components provide unmatched plasma resistance and reliability in demanding etch and CVD chambers.

Product Overview

Collar Edge Rings / Dep Rings
Focus Rings
Chamber Inserts & Liners
Other Customized Process Kit Components

These components are precision-engineered to meet the stringent requirements of 200mm and 300mm semiconductor fabrication tools, ensuring process stability and yield.

Key Material Properties & Advantages

Feature	Benefit for Your Process
Exceptional Plasma Resistance	Extends Service Life: Withstands aggressive plasma environments in etch and deposition chambers, reducing particle generation and frequency of replacement.
High Dielectric Strength	Superior Electrical Insulation: Prevents current leakage and arcing, ensuring process stability and protecting sensitive chamber components.
High Corrosion Resistance	Chemically Inert: Resists corrosion from halogen-based (e.g., CF₄, Cl₂) and other process gases, maintaining geometric integrity and process consistency.
High Purity (A998)	Minimizes Contamination: 99.8% alumina content ensures no metallic contamination, which is critical for high-purity wafer manufacturing and high yield rates.
Excellent Mechanical Strength	Durable and Reliable: Maintains structural integrity under thermal and mechanical stress, ensuring long-term performance and reducing unscheduled downtime.

Primary Applications in Semiconductor Manufacturing

Our ceramic rings are vital consumables and components within plasma chambers:

Etch Systems: Used as Focus Rings and Chamber Liners in Dielectric and Conductor Etch tools to precisely control plasma density and protect chamber walls.
CVD/PVD Systems: Serve as Collar Edge Rings and Inserts to define the processing environment and prevent unwanted deposition.
Plasma Cleaning Chambers: Act as durable Liners that resist erosion from O₂ or NF₃ plasmas, extending maintenance cycles.

Why Choose Our Alumina Ceramic Rings?

Manufactured for Precision: We specialize in producing components with tight tolerances and superior surface finishes, ensuring a perfect fit and optimal plasma performance in your specific toolset.
Designed for Performance: Our focus on material science and engineering results in parts that deliver longer service life, reduced particle counts, and improved process repeatability.
Compatible with Major Platforms: Our products are designed for use in a wide range of 200mm and 300mm semiconductor equipment from leading OEMs.

Looking for a reliable partner for your semiconductor ceramic components? Contact us today for technical specifications, pricing, and to discuss custom solutions for your application.